Substrate processing system and substrate processing method
AssigneeTokyo Electron Limited
InventorsYasuhiro Chono, Norihiro Ito
Life of this patent
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Abstract
A substrate processing system is provided with an ozone generator capable of generating an ozone-containing gas by discharging electricity in an oxygen-containing gas, and a plurality of processing chambers each capable of holding substrates therein to process the substrates by the ozone-containing gas supplied thereto. A flow regulator control an oxygen-containing gas supplied to the ozone generator. A controller controls the flow regulator to control the flow rate of the ozone-containing gas to be supplied to the processing chamber or chambers from the ozone generator through the control of the flow rate of the oxygen-containing gas supplied to the ozone generator.
Claims23
A substrate processing system comprising:
- an ozone generator provided with electrodes and configured to generate an ozone-containing gas by applying an electric discharge produced by the electrodes to an oxygen-containing gas supplied to the ozone generator;
- a plurality of processing chambers each adapted to process therein a substrate with the ozone-containing gas generated by the ozone generator;
- a plurality of ozone-containing gas supply lines each connecting the ozone generator to each of the processing chambers;
- a flow regulator adapted to regulate a flow rate of the oxygen-containing gas supplied to the ozone generator;
- and
- a controller configured to determine an ozone-containing gas demand of processes to be carried out in the processing chambers, and configured to control the flow regulator to regulate a flow rate of the oxygen-containing gas being supplied to the ozone generator so that a flow rate of the ozone-containing gas being discharged from the ozone generator to be supplied to the processing chamber or chambers complies with the ozone-containing gas demand.
A substrate processing system comprising:
- an ozone generator provided with electrodes and configured to generate an ozone-containing gas by applying an electric discharge produced by the electrodes to an oxygen-containing gas supplied to the ozone generator;
- a plurality of processing chambers each adapted to process therein a substrate with the ozone-containing gas generated by the ozone generator;
- a plurality of ozone-containing gas supply lines each connecting the ozone generator to each of the processing chambers;
- a plurality of blow-off lines, connected to each of the ozone-containing gas supply lines, adapted to discharge the ozone-containing gas from each of the ozone supply lines before the ozone-containing gas reaches each of the processing chambers;
- and
- a plurality of valves each adapted to connect or disconnect each of the blow-off lines to or from each of the ozone-containing gas supply lines.
A substrate processing system comprising:
- a plurality of first gas passages;
- a plurality of ozone generators each interposed in each of the first gas passages, each of the ozone generators being provided with electrodes and configured to generate an ozone-containing gas by applying an electric discharge produced by the electrodes to an oxygen-containing gas fed from an upstream side of each of the first gas passages to each of the ozone generator in order to discharge the ozone-containing gas therefrom toward a downstream side of each of the first gas passages;
- a second gas passage connected to the first gas passages;
- a plurality of processing chambers each adapted to process therein a substrate with the ozone-containing gas generated by the ozone generators;
- a plurality of third gas passages branched from the second gas passage and connected respectively to the processing chambers to supply the ozone-containing gas to the processing chambers;
- and
- a controller configured to determine an ozone-containing gas demand of processes to be carried out in the processing chambers, and configured to control a state of at least one of the ozone generators between a first state in which said at least one of the ozone generators is generating the ozone-containing gas and a second state in which said at least one of the ozone generator stops generating the ozone-containing gas so that a sum of flow rates being discharged from the ozone generators toward the downstream sides of the first gas passages complies with the ozone gas demand.
A substrate processing method comprising the steps of:
- providing a processing system including an ozone generator having electrodes, and a plurality of processing chambers each adapted to process a substrate therein by using an ozone-containing gas generated by the ozone generator;
- determining an ozone-containing gas demand of processes to be carried out in the processing chambers;
- feeding an oxygen-containing gas to the ozone generator at a flow rate that enables the ozone generator to discharge an ozone-containing gas at a flow rate that complies with the ozone-containing gas demand;
- applying a voltage across the electrodes of the ozone generator to produce an electric discharge, thereby producing an ozone-containing gas by applying the electric discharge to the oxygen-containing gas fed to the ozone generator;
- supplying the ozone-containing gas thus generated by the ozone generator and discharged therefrom to the processing chamber or chambers, thereby processing a substrate accommodated in each of the processing chamber or chambers with the ozone-containing gas;
- and
- changing the flow rate of the oxygen-containing gas being fed to the ozone generator, if the ozone-containing gas demand changes.
A substrate processing method comprising the steps of:
- providing a processing system including an ozone generator having electrodes, and a plurality of processing chambers each adapted to process a substrate therein by using an ozone-containing gas supplied by the ozone generator;
- determining whether or not each of the processing chambers requires the ozone-containing gas;
- feeding an oxygen-containing gas to the ozone generator;
- applying a voltage across the electrodes of the ozone generator to produce an electric discharge, thereby producing an ozone-containing gas by applying the electric discharge to the oxygen-containing gas fed to the ozone generator;
- supplying the ozone-containing gas thus generated by the ozone generator only to the chamber or chambers that are requiring the ozone-containing gas, thereby processing a substrate accommodated in each of the processing chamber or chambers with the ozone-containing gas;
- and
- discarding a part of the ozone-containing gas generated by the ozone generator without supplying it to any one of the processing chambers.
A substrate processing method comprising the steps of:
- providing a processing system including a plurality of ozone generators each having electrodes, and a plurality of processing chambers each adapted to process a substrate therein by using an ozone-containing gas supplied by the ozone generator;
- determining an ozone-containing gas demand of processes to be carried out in the processing chambers;
- determining the number of the ozone generators to be operated to generate an ozone-containing gas based on the ozone-containing gas demand;
- feeding an oxygen-containing gas to the ozone generator or generators determined to be operated;
- applying a voltage across the electrodes of the ozone generator or generators determined to be operated to produce an electric discharge, thereby producing an ozone-containing gas by applying the electric discharge to the oxygen-containing gas fed to the ozone generator or generators;
- supplying the ozone-containing gas thus generated by the ozone generator or generators to the processing chamber or chambers, thereby processing a substrate accommodated in each of the processing chamber or chambers with the ozone-containing gas;
- changing the number of the ozone generators to be operated, if the ozone-containing gas demand is increased or decreased.
Dependencies are inferred from the claim text.