Method for roll-to-roll deposition of optically transparent and high conductivity metallic thin films

57 The method of claim 1 wherein the composite film has a brightness L of at least about 80.0%, a red to green shift a of between about 0 and about 7.00 and a blue to yellow shift b of between about 0 and about 7.00.

58 A composite film made by the process of claim 1.

The composite film of claim 58 wherein the thin-film deposition technique is selected from the group consisting of DC or RF magnetron sputtering, ion beam deposition, chemical vapor deposition, ion beam enhanced deposition, and laser ablation deposition.

The composite film of claim 58 wherein the DC magnetron sputtering is performed in an atmosphere that contains argon, and optionally, oxygen.

The composite film of claim 58 wherein line speed during deposition is from about 0.6 to about 4 feet/min.

The composite film of claim 58 wherein the method further comprises the step of purging the surface of the flexible plastic substrate prior to film deposition.

The composite film of claim 58 wherein the thin conductive metallic film is an InCeO/Ag/InCeO film.

The composite film of claim 58 wherein the conductive metallic film is selected from the group consisting of silver, gold, and their alloys.

The composite film of claim 58 wherein the flexible plastic substrate is selected from the group consisting of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polycarbonate (PC), polysulfone, a phenolic resin, an epoxy resin, polyester, polyimide, polyetherester, polyetheramide, cellulose acetate, aliphatic polyurethanes, polyacrylonitrile, polytetrafluoroethylenes, polyvinylidene fluorides, poly(methyl α-methacrylates) and an aliphatic or cyclic polyolefin.

The composite film of claim 58 wherein the process for producing the composite film further comprises a post-deposition annealing step at ambient conditions.

The composite film of claim 58 wherein the composite film has a transmittance of at least about 80%.

The composite film of claim 58 wherein the composite film has an electrical resistance of no greater than about 20 Ω/square.

The composite film of claim 58 wherein the composite film has a root-mean-square roughness of no greater than about 5 nm.

The composite film of claim 58 wherein the composite film is stable to a 500 hour exposure at 60° C. in 90% relative humidity.

The composite film of claim 58 wherein the composite film has interlayer adhesion sufficiently great to survive a 180° peel adhesion test.

The composite film of claim 58 wherein the composite film is wet and dry etchable.

The composite film of claim 58 wherein the composite film includes a hard coating and is laser etchable.

The composite film of claim 58 wherein the composite film has a brightness L of at least about 80.0, a red to green shift a between about 0 and about 7.00, and a blue to yellow shift b between about 0 and about 7.00.

A multilayered electrode/substrate structure comprising the composite film of claim 58.