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US 2004/0001295 A1Published application
Plasma generation and processing with multiple radiation sources
AssigneeBTU International, Inc.
InventorsSatyendra Kumar, Devendra Kumar
Life of this patent
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Abstract
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.
Claims59
A radiation apparatus, comprising:
- a radiation cavity;
- a first radiation source for directing electromagnetic radiation having a frequency less than about 333 GHz into the cavity to facilitate formation of plasma in the cavity;
- a second radiation source for directing radiation into the cavity;
- and
- a controller for sequentially activating the second radiation source after the first radiation source is activated.
2 more elements
A plasma apparatus, comprising:
- a chamber;
- a conduit for supplying a gas to the chamber;
- a plurality of radiation sources arranged to radiate radiation into the chamber;
- and
- a controller for delaying activation of all but a first of the plurality radiation sources until after the first radiation source is activated.
2 more elements
A method employing at least first and second radiation sources both arranged to direct radiation into a plasma region, the method comprising:
- introducing gas into the plasma region;
- activating the first radiation source in order to facilitate formation of plasma in the plasma region;
- and
- activating the second radiation source after the plasma is formed.
1 more element
Dependencies are inferred from the claim text.