Substrate for liquid crystal display, liquid crystal display having the same, and method of manufacturing the same

A method of manufacturing a substrate for a liquid crystal display comprising the steps of:

• forming a first bus line and a first bus line terminal connected to the first bus line on a base substrate;
• forming a first insulation film on the first bus line and the first bus line terminal;
• forming a second bus line and a second bus line terminal connected to the second bus line on the first insulation film and forming a thin film transistor having a gate electrode connected to either of the first and second bus lines and a drain electrode connected to the other;
• forming a second insulation film on the second bus line and the second bus line terminal;
• forming a resin layer having openings above a source electrode of the thin film transistor and above the first and second bus line terminals by applying a resin on to the second insulation film and patterning the same;
• forming a wrinkled resin layer having a wrinkled surface by performing a predetermined process on the resin layer;
• etching the first and second insulation films by using the wrinkled resin layer as an etching mask;
• forming a film of a light-reflecting material on the wrinkled resin layer and patterning the same;
• and
• forming a reflective electrode connected to the source electrode having a wrinkled surface that follows the surface of the wrinkled resin layer, and forming a protective conductive film on the first and second bus line terminals.

A method of manufacturing a substrate for a liquid crystal display, comprising the steps of:

• forming a first bus line and a first bus line terminal connected to the first bus line on a base substrate;
• forming a first insulation film on the first bus line and the first bus line terminal;
• forming a second bus line and a second bus line terminal connected to the second bus line on the first insulation film and forming a thin film transistor having a gate electrode connected to either of the first and second bus lines and a drain electrode connected to the other;
• forming a second insulation film on the second bus line and the second bus line terminal;
• forming a first resin layer having openings above a source electrode of the thin film transistor and above the first and second bus line terminals by applying a resin on to the second insulation film and patterning the same;
• etching the first and second insulation films by using the first resin layer as an etching mask;
• forming a second resin layer having openings above the source electrode of the thin film transistor and above the first and second bus line terminals by applying a resin on to the second insulation film and patterning the same;
• forming a wrinkled resin layer having a wrinkled surface by performing a predetermined process on the second resin layer;
• removing a sublimate and/or a thermal oxidation film formed on the source electrode and the first and second bus line terminals by performing etching using the wrinkled resin layer as an etching mask when the wrinkled resin layer is formed;
• forming a film of a light-reflecting material on to the wrinkled resin layer and patterning the same;
• and
• forming a reflective electrode connected to the source electrode having a wrinkled surface that follows the surface of the wrinkled resin layer, and forming a protective conductive film on the first and second bus line terminals.

A method of manufacturing a reflective liquid crystal display comprising:

• forming an organic resin film by applying an organic resin on to a substrate;
• baking the organic resin film;
• hardening only a surface layer of the organic resin film by applying charged particles to the same;
• forming wrinkle-like recesses and projections on a surface of the organic resin film by performing a thermal process on the same;
• and
• forming a reflective electrode on the organic resin film.

A method of manufacturing a reflective liquid crystal display, comprising the steps of:

• forming a gate bus line to which a scan signal is supplied, a data bus line to which a display signal is supplied, and a thin film transistor whose gate electrode is connected to the gate bus line and whose drain electrode is connected to the data bus line on a first substrate;
• forming an insulation film above the gate bus line, the data bus line, and the thin film transistor;
• forming a first photoresist film on the insulation film;
• performing first exposure and developing to form an opening in a position of the first photoresist film associated with a source electrode of the thin film transistor;
• etching the insulation film using the first photoresist film as a mask to form a contact hole that leads to the source electrode of the thin film transistor;
• removing the first photoresist film;
• forming a second photoresist film on the insulation film;
• performing second exposure and developing to form an opening in a position of the second photoresist film associated with the contact hole;
• doping a surface layer of the second photoresist film with charged particles;
• forming wrinkle-like recesses and projections on a surface of the second photoresist film by performing a thermal process on the same;
• forming a conductive reflective film throughout a top entire surface of the second photoresist film;
• forming a first electrode by patterning the reflective film;
• arranging a second substrate having a second electrode comprising a conductor film provided thereon and the first substrate opposite to each other;
• and
• sealing a liquid crystal between the first and second substrates.

A method of manufacturing a reflective liquid crystal display, comprising the steps of:

• forming a gate bus line to which a scan signal is supplied, a data bus line to which a display signal is supplied, and a thin film transistor whose gate electrode is connected to the gate bus line and whose drain electrode is connected to the data bus line on a first substrate;
• forming an insulation film above the gate bus line, the data bus line, and the thin film transistor;
• forming a photoresist film on the insulation film;
• performing exposure and developing to form an opening in a position of the photoresist film associated with a source electrode of the thin film transistor;
• forming a contact hole that leads to the source electrode of the thin film transistor by etching the insulation film using the photoresist film as a mask;
• doping a surface layer of the photoresist film with charged particles;
• forming wrinkle-like recesses and projections on a surface of the photoresist film by performing a thermal process on the same;
• forming a conductive reflective film throughout a top entire surface of the photoresist film;
• forming a first electrode by patterning the reflective film;
• arranging a second substrate having a second electrode comprising a conductor film provided thereon and the first substrate opposite to each other;
• and
• sealing a liquid crystal between the first ans second substrates.

A reflective liquid crystal display comprising:

• a liquid crystal sealed between a pair of substrates;
• a gate bus line to which a scan signal is supplied, a data bus line to which a display signal is supplied, a thin film transistor whose gate electrode is connected to the gate bus line and whose drain electrode is connected to the data bus line on either of the pair of substrates;
• an organic resin film formed above the gate bus line, the data bus line, and the thin film transistor and provided with wrinkle-like recesses and projections on a surface thereof, wherein the recesses and projections of the organic resin film being formed by performing a thermal process after doping a surface layer thereof with charged particles;
• and
• a reflective electrode formed on the organic resin film and provided with recesses and projections that follow the recesses and projections of the organic resin film.