Apparatus and method for inspecting pattern
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorHiroshi Asai
Life of this patent
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AssigneeDainippon Screen Mfg. Co., Ltd.
InventorHiroshi Asai
Estimating the term…
An inspection apparatus (1) comprises an image pickup part (2) for performing an image pickup of a substrate (9), an operation part (4) to which an image signal is inputted from said image pickup part (2) and a computer (5), and the operation part (4) specifies an inspection image and a reference image from an object image acquired by the image pickup part (2). In the operation part (4), a class teaching part (501) generates a teaching image from the inspection image and an image sampling part (502) samples a plurality of pixels from the teaching image while a feature value calculation part (43) calculates pixel feature values from values of corresponding pixels in the inspection image and the reference image. A dataset generation part (503) generates a dataset of pixel feature values and a class on each of the sampled pixels. A classifier construction part (504) performs training with the dataset to generate a defect check condition and the defect check condition is inputted to an inspection result generation part (44). With this operation, the inspection apparatus (1) can efficiently and appropriately detect defects.
An apparatus for inspecting pattern on an object, comprising:
A method of inspecting pattern on an object, comprising the steps of:
A computer-readable recording medium carrying a program for inspection of pattern on an object, wherein execution of said program by a computer causes said computer to perform the steps of:
Dependencies are inferred from the claim text.