Pattern image comparison method, pattern image comparison device, and program

A pattern image comparison device, comprising:

• a first input unit for inputting a first pattern image based on design data for a reticle mask or a semiconductor device;
• a second input unit for inputting a second pattern image of said reticle mask or semiconductor device manufactured based on said design data;
• a calculating unit for calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of said first pattern image and said second pattern image;
• and
• an output unit for outputting a result of comparison of a pattern on said reticle mask or semiconductor device and a pattern of said design data based on said calculated parameters of said first and second pattern images.

A computer program product for designing circuit, comprising:

• computer readable program code means for inputting a first pattern image based on design data for a reticle mask or a semiconductor device;
• computer readable program code means for inputting a second pattern image of said reticle mask or semiconductor device manufactured based on said design data;
• calculating program code means for calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of said first pattern image and said second pattern image;
• and
• output program code means for outputting a result of comparison of a pattern on said reticle mask or semiconductor device and a pattern of said design data based on said calculated parameters of said first and second pattern images.