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US 2003/0227607 A1Published application
Exposure apparatus and an exposure method
OwnerMasaki Kato, Motoo Koyamainventors
Life of this patent
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Abstract
There is disclosed an exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate, comprising a light source; and an illumination optical system that illuminates the mask with light from this light source, wherein the illumination optical system comprises wavelength width changeover unit that changes over the wavelength width of the light that is directed onto said mask in accordance with the photosensitivity characteristics of the photosensitive substrate.
Claims82
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate, comprising:
- a light source;
- and
- an illumination optical system that illuminates the mask with light from this light source,
- wherein said illumination optical system comprises wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask in accordance with the photosensitivity characteristics of said photosensitive substrate.
1 more element
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate, comprising:
- a light source;
- and
- an illumination optical system that illuminates the mask with light from this light source,
- wherein said illumination optical system comprises wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask in accordance with the resolution of the pattern that is transferred onto said photosensitive substrate.
1 more element
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate, comprising:
- a light source;
- and
- an illumination optical system that illuminates the mask with light from this light source,
- wherein said illumination optical system comprises:
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- storage means that stores illumination optical characteristics information indicating the optical characteristics of said illumination optical system appropriate to transfer of said pattern onto said photosensitive substrate for each wavelength width to which changeover is effected by said wavelength width changeover means;
- and
- control means that adjusts the optical characteristics of said illumination optical system in accordance with said illumination optical system characteristics information stored in said storage means when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
5 more elements
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate, comprising:
- a light source;
- and
- an illumination optical system that illuminates the mask with light from this light source;
- wherein said illumination optical system comprises:
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- illumination optical characteristics detection means that detects the optical characteristics of said illumination optical system;
- and
- control means that adjusts the optical characteristics of said illumination optical system in accordance with the detection results of said illumination optical characteristics detection means when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
5 more elements
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate, comprising:
- a light source;
- and
- an illumination optical system that illuminates the mask with light from this light source
- wherein said illumination optical system comprises:
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- a sensor that detects the intensity of the light directed onto said mask;
- and
- control means that adjusts the characteristics of said sensor in accordance with said wavelength width when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
5 more elements
The exposure apparatus according to claim. 40, comprising projection optical characteristics detection means that detects the optical characteristics of said projection optical system, and
- wherein said control means adjusts at least one of the optical characteristics of said projection optical system, the position of said mask along said optical axis direction and the position of said photosensitive substrate along said optical axis direction while referring to the detection results of said projection optical characteristics detection means, when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
An exposure apparatus comprising:
- a light source;
- an illumination optical system that illuminates a mask with light from this light source;
- a projection optical system that projects a pattern formed on said mask onto a photosensitive substrate using light from this illumination optical system;
- a mask stage on which said mask is placed;
- a substrate stage on which said photosensitive substrate is placed;
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- storage means that stores projection optical characteristics information indicating the optical characteristics of the projection optical system that are appropriate for transfer of said pattern onto said photosensitive substrate for each wavelength width that is changed over by said wavelength width changeover means;
- and
- control means that controls said wavelength width changeover means;
- wherein at least one of said mask stage and said substrate stage is constructed so as to be capable of movement in the direction along the optical axis of said projection optical system;
- and
- said control means adjusts at least one of the optical characteristics of said projection optical system, the position of said mask along said optical axis direction and the position of said photosensitive substrate along said optical axis direction in accordance with said projection optical characteristics information stored in said storage means when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
9 more elements
An exposure apparatus comprising:
- a light source;
- an illumination optical system that illuminates a mask with light from this light source
- a projection optical system that projects a pattern formed on said mask onto a photosensitive substrate using light from this illumination optical system;
- a mask stage on which said mask is placed;
- a substrate stage on which said photosensitive substrate is placed;
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- projection optical characteristics detection means that detects the optical characteristics of said projection optical system;
- and
- control means that controls said wavelength width changeover means;
- wherein at least one of said mask stage and said substrate stage is constructed so as to be capable of movement in the direction along the optical axis of said projection optical system;
- and
- said control means adjusts at least one of the optical characteristics of said projection optical system, the position of said mask along said optical axis direction and the position of said photosensitive substrate along said optical axis direction in accordance with the detection results of said projection optical characteristics detection means when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
9 more elements
An exposure apparatus comprising:
- a light source;
- an illumination optical system that illuminates a mask with light from this light source;
- a projection optical system that projects a pattern formed on said mask onto a photosensitive substrate using light from this illumination optical system;
- a mask stage on which said mask is placed;
- a substrate stage on which said photosensitive substrate is placed;
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- storage means that stores variation information indicating the relationship between the period of illumination in respect of said projection optical system and the amount of variation of the optical characteristics of said projection optical system for each wavelength width that is changed over by said wavelength width changeover means;
- and
- control means that controls said wavelength width changeover means;
- wherein at least one of said mask stage and said substrate stage is constructed so as to be capable of movement in the direction along the optical axis of said projection optical system;
- and
- said control means adjusts at least one of the optical characteristics of said projection optical system, the position of said mask along said optical axis direction and the position of said photosensitive substrate along said optical axis direction in accordance with the variation information stored in said storage means when the wavelength width of the light that is directed onto said mask is changed over by controlling said wavelength width changeover means.
9 more elements
An exposure apparatus comprising:
- a light source;
- an illumination optical system that illuminates a mask with light from this light source;
- a projection optical system that projects a pattern formed on said mask onto a photosensitive substrate using light from this illumination optical system;
- a mask stage on which said mask is placed;
- a substrate stage on which said photosensitive substrate is placed;
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- control means that controls said wavelength width changeover means;
- and
- a position measurement device that measures the position of a reference member formed on said substrate stage and a mark formed on said photosensitive substrate using light of wavelength width that is changed over by said wavelength width changeover means and that finds the position of the photosensitive substrate placed on said substrate stage from the respective measurement results;
- wherein said position measurement device finds the reference position of said substrate stage by measuring the position of said reference member every time the wavelength width of the light that is directed onto said mask is changed over by said control means controlling said wavelength width changeover means.
7 more elements
An exposure apparatus comprising:
- a light source;
- an illumination optical system that illuminates a mask with light from this light source;
- a projection optical system that projects a pattern formed on said mask onto a photosensitive substrate using light from this illumination optical system;
- a mask stage on which said mask is placed;
- a substrate stage on which said photosensitive substrate is placed;
- wavelength width changeover means that changes over the wavelength width of the light that is directed onto said mask;
- control means that controls said wavelength width changeover means;
- a first measurement device that measures the position where the pattern that is formed on said mask is projected;
- a second measurement device provided laterally with respect to said projection optical system and that measures the mark that is formed on said photosensitive substrate that is placed on said substrate stage;
- and
- position calculating means that finds the position of said photosensitive substrate with respect to the position where said pattern is projected based on the measurement result of the said first measurement device and the measurement result of the said second measurement device;
- wherein said first measurement device measures the position where said pattern is projected every time the wavelength width of the light that is directed onto said mask is changed over by said control means controlling said wavelength width changeover means.
9 more elements
An exposure method for transferring a pattern formed on a mask to a photosensitive substrate by directing light from a light source on to this mask,
- wherein said method comprises a changeover step of changing over the wavelength width of the light that is directed onto said mask in accordance with the photosensitivity characteristics of said photosensitive substrate.
An exposure apparatus for transferring a pattern formed on a mask to a substrate to which a photosensitive material has been applied, comprising:
- an illumination device comprising a light source and illuminance detection means that detects the illuminance of the light from this light source and that exercises control such that the light from said light source has a constant illuminance, in accordance with recipe data including the detection value from this illuminance detection means and information relating to the spectral characteristics of said photosensitive material;
- and
- a projection optical system that projects said pattern on the mask illuminated with light from said illumination device on to said substrate.
Dependencies are inferred from the claim text.