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US 2003/0227283 A1Published application
Non-intrusive plasma probe
AssigneeApplied Materials, Inc.
InventorsMichael S. Cox, Canfeng Lai, Qiwei Liang
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Abstract
A probe for measuring plasma properties in a processing chamber, comprises a conductive rod having a front portion and a rear portion. The front portion of the conductive rod comprises a probe surface adapted to be coplanar with an interior wall of the chamber. The probe also includes an insulating sheath circumscribing the conductive rod.
Claims31
A probe for measuring plasma properties in a processing chamber, comprising:
- a conductive rod comprising a front portion and a rear portion, wherein the front portion comprises a probe surface adapted to be coplanar with an interior wall of the chamber;
- and
- an insulating sheath circumscribing the conductive rod.
A probe for measuring plasma properties in a processing chamber, comprising:
- a conductive rod including a front portion and a rear portion, wherein the front portion comprises a probe surface having a rounded edge, wherein the probe surface is adapted to be coplanar with an interior wall of the chamber, and wherein the rear portion is adapted to be connected to one or more monitoring devices;
- a front insulating sheath circumscribing and in contact with the front portion of the conductive rod, wherein the front sheath comprises a rim that extends beyond the probe surface into an interior of the chamber;
- and
- a rear insulating sheath circumscribing and in contact with the rear portion of the conductive rod.
1 more element
A probe for measuring plasma properties in a processing chamber, comprising:
- a conductive rod including a front portion and a rear portion, wherein the front portion comprises a probe surface having a rounded edge, wherein the probe surface is adapted to be coplanar with an interior wall of the chamber, wherein the rear portion comprises a flanged area, and wherein the rear portion is adapted to be connected to one or more monitoring devices;
- a front insulating sheath circumscribing and in contact with the front portion of the conductive rod, wherein the front sheath comprises a rim that extends beyond the probe surface into an interior portion of the chamber;
- a rear insulating sheath circumscribing and in contact with the rear portion of the conductive rod;
- a first seal positioned between the front sheath and the flanged area of the conductive rod;
- and
- a second seal positioned between the front sheath and an exterior wall of the chamber.
3 more elements
Dependencies are inferred from the claim text.