Vaporizing reactant liquids for chemical vapor deposition film processing

A chemical vapor deposition system using a liquid reactant and a carrier gas, comprising:

• a chemical vapor deposition chamber having a gas inlet port, and
• a liquid reactant vaporizer having an outlet port connected to said chamber inlet port, said vaporizer comprising:
• a valve body defining a control valve cavity having first, second and third apertures, said outlet port connected to said third aperture through a first fluid channel,
• a gas inlet port connected to said first aperture through a second fluid channel for receiving said carrier gas at a given pressure,
• a liquid inlet port connected to said second aperture through a third fluid channel for receiving said liquid reactant at a flow rate and a pressure above said given pressure,
• a diaphragm disposed adjacent to said second aperture for forming a vaporization region having a pressure gradient, said vaporization region circumscribing said liquid inlet port and having a substantially larger width than said inlet port, and
• wherein liquid reactant supplied through said liquid inlet port vaporizes in said valve cavity to form a vaporized reactant, mixes with said carrier gas, and is carried out of said vaporizer through said outlet port.