Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
AssigneeShipley Company, L.L.C.
InventorsGeorge G. Barclay, Wang Yueh
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Abstract
The invention includes polymers that contain a heterocyclic ring, preferably an oxygen- or sulfur-containing ring. The heterocyclic ring is preferably fused to the polymer backbone. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.
Claims42
A photoresist composition comprising a photoactive component and a polymer that comprises:
- i) a heteroalicyclic group fused to the polymer backbone and that contains one or more oxygen or sulfur ring members;
- ii) a carbon alicyclic group fused to the polymer backbone;
- and iii) a photoacid-labile moiety.
A photoresist composition comprising a photoactive component and a polymer that comprises i) a heteroalicyclic group that contains one or more sulfur ring members;
- and ii) a photoacid-labile moiety.
A polymer that comprises:
- i) a heteroalicyclic group fused to the polymer backbone and that contains one or more oxygen or sulfur ring members;
- ii) a carbon alicyclic group fused to the polymer backbone;
- and iii) a photoacid-labile moiety.
A polymer that comprises:
- i) a heteroalicyclic group that contains one or more sulfur ring members;
- and ii) a photoacid-labile group.
A polymer that comprises units of the following Formula III:
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- wherein W is a linker;
- wherein X, Y, and each Z are each independently carbon, oxygen, or sulfur, with at least one of X, Y or Z being oxygen or sulfur;
- each R is the same or different non-hydrogen substituent;
- m is 1, 2, 4 or 5;
- n is an integer of from 0 to the maximum value substitution permitted by the valences of the ring members;
- and p is the mole percent of the units in the polymer.
Dependencies are inferred from the claim text.