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US 2003/0223077 A1Published application
Compensation for geometric effects of beam misalignments in plane mirror interferometers
AssigneeZygo Corporation
InventorHenry A. Hill
Life of this patent
Estimating the term…
Abstract
Techniques for compensating for geometric effects of beam misalignment in plane mirror interferometers are disclosed.
Claims46
A method comprising:
- using an interferometer in an interferometry system to produce an output beam comprising a phase related to an optical path difference between two beam paths, at least one of which contacts a measurement object in the interferometry system;
- providing precalibrated information that accounts for contributions to the optical path difference caused by a deviation of at least one of the beam paths from a nominal beam path due to an imperfection in the interferometry system;
- and
- determining a position of the measurement object with respect to at least one degree of freedom based on information derived from the output beam and the precalibrated information.
1 more element
A method comprising:
- using an interferometer to produce an output beam comprising a phase related to an optical path difference between two beam paths, at least one of which contacts a measurement object;
- providing precalibrated information that accounts for contributions to the optical path difference caused by a deviation of at least one of the beam paths from a nominal beam path due to an imperfection in at least one of a light source for the interferometer, the interferometer, or the measurement object;
- and
- determining a displacement of the measurement object relative to the interferometer based on the precalibrated information and information derived from the output beam.
1 more element
A method comprising:
- correcting interferometric measurements made by an interferometry system based on precalibrated information that accounts for contributions to an optical path difference caused by a deviation of at least one beam path from a nominal beam path due to an imperfection in the interferometry system.
A method comprising:
- calibrating an interferometry system by determining information that accounts for contributions to an optical path difference caused by a deviation of at least one beam path from a nominal beam path due to an imperfection in the interferometry system.
An apparatus comprising:
- an interferometer configured to produce an output beam comprising a phase related to an optical path difference between two beam paths, at least one of which contacts a measurement object;
- and
- an electronic controller coupled to the interferometer, wherein during operation the electronic controller determines a position of the measurement object with respect to at least one degree of freedom based on information derived from the output beam and precalibrated information that accounts for contributions to the optical path difference caused by a deviation of at least one of the beam paths from a nominal beam path due to an imperfection in at least one of a light source for the interferometer, the interferometer, or the measurement object.
An apparatus comprising an electronic storage medium storing precalibrated information that accounts for contributions to the optical path difference caused by a deviation of at least one of the beam paths from a nominal beam path due to an imperfection in at least one of a light source for the interferometer, the interferometer, or the measurement object.
Dependencies are inferred from the claim text.