Method of making photonic crystal

Abstract

A periodic pattern of thin-film metal (gold) island regions 25 is formed over the entire surface area of a (111) single-crystal silicon layer overlying a layer of a material (silicon dioxide) 22 different in refractive index from silicon, and silicon monocrystalline rods 26 are grown beneath the thin-film metal island regions in a silicon tetrachloride gas atmosphere at high temperatures to form columnar crystallites, thereby manufacturing a photonic crystal of a structure having the columnar crystallites arranged at periodic intervals. It is possible to obtain columnar crystallites whose surface roughness is as small as 10 nm or less in terms of the center-line average roughness Ra, for instance.

Dependencies are inferred from the claim text.