Polymers, resist compositions and patterning process
AssigneesShin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd.
InventorsYuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura
Life of this patent
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Abstract
A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.
Claims10
A polymer comprising recurring units of the following general formula (1) and having a weight average molecular weight of 1,000 to 500,000,
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- wherein R1 to R3 each are hydrogen, fluorine or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, R4 is a valence bond or a straight, branched or cyclic alkylene or fluorinated alkylene group of 1 to 20 carbon atoms, and R5 is a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hetero atom.
A polymer comprising recurring units of the following general formula (2a) or (2b) and having a weight average molecular weight of 1,000 to 500,000,
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- wherein R6 is a methylene group, oxygen atom, sulfur atom or SO2, R7 to R10 each are hydrogen, fluorine, a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms or —R11—SO2R12, at least one of R7 to R10 containing —R11—SO2R12, R11 is a valence bond or a straight, branched or cyclic alkylene or fluorinated alkylene group of 1 to 20 carbon atoms, R12 is fluorine or a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hetero atom, a1 is 0 or 1, and a2 is an integer of 0 to 2.
A polymer comprising recurring units each having a functional group of the following general formula (3), and having a weight average molecular weight of 1,000 to 500,000,
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- wherein R13 is a methylene group, oxygen atom, sulfur atom or SO2, R14 to R17 each are hydrogen, a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms, —R18—SO3R19 or —R18—SO2R19, at least one of R14 to R17 containing —R18—SO3R19 or —R18—SO2R19, R18 is a valence bond or a straight, branched or cyclic alkylene group of 1 to 20 carbon atoms, R19 is hydrogen, an acid labile group, an adhesive group or a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms, and b is 0 or 1.
Dependencies are inferred from the claim text.