Negative-working photoimageable bottom antireflective coating
OwnerJoseph E. Oberlander, Ralph R. Dammel +3inventors
InventorsJoseph E. Oberlander, Ralph R. Dammel, Shuji Ding-Lee, Mark O. Neisser, Medhat A. Toukhy
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Abstract
The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.
Claims24
A negative bottom photoimageable antireflective coating composition which is capable of being developed in an alkaline developer and which is coated below a negative photoresist, where the antireflective coating composition comprises a photoacid generator, a crosslinking agent and an alkali soluble polymer.
The composition according to claim 3, where the dye is selected from a monomeric dye, a polymeric dye and a mixture of a monomeric and a polymeric dyes.
A nonphotosensitive negative bottom photoimageable antireflective coating composition which is capable of being developed in an alkaline developer and which is coated below a negative photoresist, where the antireflective coating composition comprises a crosslinking agent and an alkali soluble polymer.
A process for forming a negative image comprising;
- a) providing a coating of a negative bottom photoimageable and alkali developable antireflective coating composition on a substrate;
- b) providing a coating of a top photoresist layer;
- c) imagewise exposing the top and bottom layer to actinic radiation of same wavelength;
- d) postexposure baking the substrate;
- and,
- e) developing the top and bottom layer with an aqueous alkaline solution.
A negative bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer and which is coated below a negative photoresist, where the antireflective coating composition comprises a photoacid generator and an aqueous alkali soluble polymer that rearranges upon exposure to become insoluble in an aqueous alkaline developer.
A negative bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer and which is coated below a negative photoresist, where the antireflective coating composition comprises an aqueous alkali soluble polymer that rearranges upon exposure to become insoluble in an aqueous alkaline developer.
Dependencies are inferred from the claim text.