Process for thick film circuit patterning
AssigneeE. I. Du Pont de Nemours and Company
InventorRoupen Leon Keusseyan
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AssigneeE. I. Du Pont de Nemours and Company
InventorRoupen Leon Keusseyan
Estimating the term…
A process for patterning thick film electrically functional patterns using a photosensitive polymer layer. A tacky photosensitive layer is applied onto a substrate surface. The photosensitive layer is imaged with a pattern using actinic radiation, the exposed areas of the photosensitive layer become hardened and non-tacky. A subsequent application of a thick film composition sheet will cause the thick film to adhere to the remaining tacky areas. Upon peeling the sheet, a thick film print pattern will be produced. This step is followed by a processing profile prescribed by the thick film composition used which results in a pattern having electrically functional properties. The invention also extends to a process wherein a thick film composition is recovered from a used sheet.
A process for forming a pattern having electrically functional properties on a substrate comprising the steps of:
A process for forming a pattern having electrically functional properties on a substrate comprising the steps of:
A process for forming a pattern having electrically functional properties on a substrate comprising the steps of:
A process for the recovery of a thick film composition from a support comprising a support having a dried thick film composition in the form of a reverse circuit pattern comprising the sequential steps of:
An intermediate having a pattern for forming electrically functional properties comprising an imaged layer having tacky and non-tacky areas disposed on a substrate which areas are in contact with a thick film composition disposed on a support.
A method for using a photosensitive layer to form a pattern having electrically functional properties with a thick film composition, comprising the steps of:
A system for forming a circuit pattern comprising:
Dependencies are inferred from the claim text.