Method and device for decontaminating optical surfaces
AssigneeCarl Zeiss SMT GmbH
InventorsJens Luedecke, Christoph Zazcek, Alexandra Pazidis, Jens Ullmann, Annette Muehlpfordt, Michael Thier, Stefan Wiesner
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Abstract
A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.
Claims19
A method for decontaminating surfaces of beam-guiding optics, comprising:
- irradiating the surfaces to be cleaned with UV-radiation in a cleansing atmosphere,
- wherein the wavelength of the UV-radiation employed for cleaning falls within a spectral range where oxygen absorbs strongly and the cleansing atmosphere has an oxygen concentration less than that of air.
A device for decontaminating surfaces of beam-guiding optics, comprising:
- at least one UV-radiation source (2) generating UV-radiation for cleaning purposes, and
- means (4, 5) for providing a predetermined cleansing atmosphere,
- wherein the wavelength of the UV-radiation employed for cleaning falls within a spectral range where oxygen absorbs strongly and the means for providing the cleansing atmosphere is designed to provide a cleansing atmosphere that has an oxygen concentration less than that of air.
A cleaning apparatus for optical elements, comprising:
- at least one radiation source generating ultraviolet radiation at a wavelength that produces ozone from molecular oxygen, and
- a cleansing agent that contains molecular oxygen.
Dependencies are inferred from the claim text.