Multiple image photolithography system and method
AssigneeTexas Instruments Incorporated
InventorsMichael C. Smayling, Frank Tittel, William L. Wilson JR.
Life of this patent
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Abstract
A multiple image photolithography system includes a radiation source (18) projecting electromagnetic radiation along a path. A reticle cartridge (26) is located in the path of the projected radiation. The cartridge (26) includes a photomask (34,36) located in the path of the projected radiation and a Fabry-Perot interferometer (54) located in the path of the projected radiation. A radiation-sensitive material (30) is located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge (26) before the projected radiation encounters the radiation-sensitive material (30).
Claims20
A multiple image photolithography system, comprising:
- a radiation source projecting electromagnetic radiation along a path;
- a reticle cartridge located in the path of the projected radiation, the cartridge comprising a photomask located in the path of the projected radiation and a Fabry-Perot interferometer located in the path of the projected radiation;
- and
- a radiation-sensitive material located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge before the projected radiation encounters the radiation-sensitive material.
A reticle cartridge for providing multiple mask images comprising:
- a photomask having first and second sides, the second side partially coated with a radiation blocking material and having coated and uncoated portions, the uncoated portions defining a pattern;
- an interferometer frame attached to the second side of the photomask and defining a first area of the second side, the first area being not in contact with the interferometer frame and within the portions of the second side that are in contact with the interferometer frame;
- and
- an interferometer plate comprising a Fabry-Perot interferometer, the interferometer plate coupled to the interferometer frame and covering the first area of the second side of the photomask, the combination of photomask, frame and interferometer adapted to be removably inserted into a stepper.
A method for projecting multiple radiation images onto photoresist, comprising the steps of:
- inserting a first substrate covered with photoresist into a stepper;
- placing the first substrate within a radiation path projected by a radiation source of the stepper;
- inserting a first photomask and a Fabry-Perot interferometer into the stepper;
- placing the first photomask and the Fabry-Perot interferometer within the radiation path with the first photomask between the radiation source and the Fabry-Perot interferometer, and the Fabry-Perot interferometer between the first photomask and the first substrate;
- projecting radiation from the radiation source that passes through the first photomask and the Fabry-Perot interferometer before reaching the photoresist.
Dependencies are inferred from the claim text.