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US 2003/0209676 A1Published application
Particle multibeam lithography
AssigneeIMS-Innenmikrofabrikations Systeme GmbH
InventorsHANS LOSCHNER, GERHARD STENGL, HERBERT VONACH
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AssigneeIMS-Innenmikrofabrikations Systeme GmbH
InventorsHANS LOSCHNER, GERHARD STENGL, HERBERT VONACH
Estimating the term…
In a particle multibeam lithography apparatus an illumination system (242) having a particle source (203) produces an illuminating beam (205) of electrically charged particles, and a multibeam optical system (208) positioned after the illumination system (242) and comprising at least one aperture plate having an array of a plurality of apertures to form a plurality of sub-beams focuses the sub-beams onto the surface of a substrate (220), wherein for each sub-beam (207) a deflection unit (210) is positioned within the multibeam optical system and adapted to correct individual imaging aberrations of the respective sub-beam with respect to the desired target position and/or position the sub-beam during a writing process an the substrate surface Preferably, for each sub-beam the respective aperture of the first aperture plate defines the size and shape of the sub-beam cross-section and the multibeam optical system produces a demagnified image of the aperture on the substrate surface, with a demagnification of at least 20:1.
An apparatus for multibeam lithography by means of electrically charged particles, comprising an illumination system having a particle source, the illumination system producing an illuminating beam of said electrically charged particles, and a multibeam optical system positioned after the illumination system as seen in the direction of the bean, said multibeam optical system comprising at least one aperture plate having an array of a plurality of apertures to form a plurality of sub-beams, wherein the multibeam optical system focuses the sub-beams onto the surface of a substrate,
A method for multibeam lithography by means of electrically charged particles, wherein a particle beam is produced by a particle source, transferred into an illuminating beam and formed into a plurality of sub-beams, the sub-beams being formed by means of at least one aperture plate having an array of a corresponding plurality of apertures and the sub-beam are focused onto the surface of a substrate,
Dependencies are inferred from the claim text.