Substrate support with fluid retention band
AssigneeApplied Materials, Inc.
InventorDmitry Lubomirsky
Life of this patent
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Abstract
An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath for processing the substrate. The band is adapted to deflect under centrifugal force to release the fluid from the substrate as the body is rotated above a predetermined rate.
Claims27
Apparatus for supporting a substrate, comprising:
- a body having a first side, the first side having a center portion adapted to support the substrate;
- and
- an annular band coupled to the first side of the body and adapted to retain a liquid above the substrate seated on the center portion.
Apparatus for supporting a substrate, comprising:
- a body having a first side, the first side having a center portion adapted to support the substrate;
- and
- an annular elastomeric band extending from the first side of the body at an angle between about 0.5 to about 100 degrees and adapted to retain a liquid above the substrate seated on the center portion.
Apparatus for supporting a substrate, comprising:
- an annular flange having a sealing surface adapted to support the substrate thereon;
- and
- an annular elastomeric band extending from the flange at an angle between about 0.5 to about 100 degrees, the band having a distal end extending to a first elevation of at least 0.5 mm above the sealing surface and adapted to displace to a second elevation of less than about 50 mm above the sealing surface when subjected to rotation in excess of about 1000 revolutions per minute.
Apparatus for substrate processing, comprising:
- a rotatable body having a center substrate support portion;
- an elastomeric band circumscribing the center support portion and coupled to the body;
- a drive adapted to rotate the body about its axis;
- and
- fluid delivery system adapted to flow fluid into a volume defined by the band and the body, wherein the volume is sufficient to immerse a substrate.
A method for processing a substrate, comprising:
- flowing a fluid onto a substrate supported on a substrate support, the fluid at least partially retained at a level above the substrate by an elastomeric band circumscribing the substrate;
- processing the substrate;
- and
- rotating the substrate support to remove the fluid from the wafer surface.
A substrate support comprising:
- a rotatable body having a first side adapted to support a substrate;
- and
- a deformable annular band adapted to retain a liquid above the substrate when the substrate is seated on the first side of the body and to deflect to release the liquid upon the body being rotated at a predetermined rate.
Dependencies are inferred from the claim text.