Shutter
AssigneeTrikon Technologies Limited
InventorsGordon Robert Green, Robert Kenneth Trowell
Life of this patent
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Abstract
This invention relates to a shutter for use in physical vapour deposition apparatus having a chamber. The shutter, generally indicated at 5, is located in a side housing 6 of the vacuum chamber 7, whilst sputtering is taking place. Once the substrate 2 is treated, the substrate is removed from the chamber and the shutter is brought in to an operative position above a wafer pedestal or support 1. The shutter is mounted on an arm 8 using a fixing boss 10, the arm and the boss being magnetically coupled.
Claims5
A shutter for use in a deposition apparatus having a chamber, the shutter including a shutter blade, a support for supporting the shutter blade during movement between an operative position and an inoperative position characterised in that the shutter blade is secured to the support magnetically.
Dependencies are inferred from the claim text.