Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus
AssigneeNikon Corporation
InventorYukiharu Okubo
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AssigneeNikon Corporation
InventorYukiharu Okubo
Estimating the term…
An inspection method using an electron beam. Emitted charged particles from an electron gun located inside a primary column are accelerated to form a primary beam. A cross section of the primary beam is shaped a desired shape by a primary optical system located inside the primary column. A trajectory of the primary beam is deflected using a primary deflector located inside the primary column. A sample is illuminated using the primary beam, the sample being on a stage to which a retarding voltage is applied. At least one of secondary electrons, reflected electrons or backwardly scattered electrons that are emerging from the sample on the stage are accelerated toward a second column to form a secondary beam. A trajectory of the secondary beam is deflected using a secondary deflector located inside the secondary column. The secondary beam is guided to a detector located inside the secondary column.
An inspection method using an electron beam of an apparatus that has a primary column, a secondary column and a chamber, the method comprising steps of:
Dependencies are inferred from the claim text.