Electrocoating process to form a dielectric layer in an organic substrate to reduce loop inductance
AssigneeIntel Corporation
InventorsPaul H. Wermer, Brian Kaiser
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AssigneeIntel Corporation
InventorsPaul H. Wermer, Brian Kaiser
Estimating the term…
The present invention includes forming a thin, conformal, high-integrity dielectric coating between conductive layers in a via-in-via structure in an organic substrate using an electrocoating process to reduce loop inductance between the conductive layers. The dielectric coating is formed using a high dielectric constant material such as organic polymers and organic polymer mixtures. The present invention also includes forming a thin, dielectric coating between conductive layers on a substantially planar substrate material and an embedded capacitor to reduce loop inductance.
A method of forming a self-aligned through via-in-via structure in an organic substrate material, comprising:
A method of forming an organic dielectric layer in a self-aligned through via-in-via structure, comprising:
A method of forming an organic dielectric layer on a substantially planar multilayered organic substrate material, comprising:
A method of forming a capacitor, comprising:
A capacitor, comprising:
A multilayered print circuit board, comprising:
Dependencies are inferred from the claim text.