Management system and apparatus, method therefor, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsSatoru Oishi, Hideki Ina, Takehiko Suzuki, Koichi Sentoku, Takahiro Matsumoto
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AssigneeCanon Kabushiki Kaisha
InventorsSatoru Oishi, Hideki Ina, Takehiko Suzuki, Koichi Sentoku, Takahiro Matsumoto
Estimating the term…
A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an “inspection result” obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3 σ) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.
An industrial device management system comprising:
A management method of managing a parameter for an industrial device which operates in accordance with a parameter, comprising:
A management apparatus for managing an industrial device, comprising:
An industrial device management method using an apparatus connected via communication means to an industrial device which operates in accordance with a parameter, comprising:
Dependencies are inferred from the claim text.