Photosensitive resin composition

A photosensitive resin composition comprising:

• (A) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developer, the resin having:
• a repeating unit represented by formula (IA) below;
• and
• a repeating unit containing an acid decomposable group and copolymerizable with the repeating unit represented by formula (IA);
• (B1) a compound capable of generating an aliphatic or aromatic sulfonic acid upon irradiation with actinic rays or radiation, in which the aliphatic or aromatic sulfonic acid is substituted by at least one fluorine atom;
• (B2) a compound capable of generating one of an aliphatic sulfonic acid, an aromatic sulfonic acid, an aliphatic carboxylic acid and an aromatic carboxylic acid upon irradiation with actinic rays or radiation, in which each of the aliphatic sulfonic acid and the aromatic sulfonic acid contains no fluorine atom;
• and
• (C) a solvent:
• 88
• wherein R1a to R1d each independently represents a hydrogen atom, a fluorine atom, an alkyl group, an alkyl group in which at least one hydrogen atom is substituted by a fluorine atom, a perfluoroalkyl group, a cycloalkyl group, an aryl group, —OR′, —CO2R′ or —CONHR′, R′ represents an alkyl group, an alkyl group in which at least one hydrogen atom is substituted by a fluorine atom, a perfluoroalkyl group, a cycloalkyl group, an aryl group or an aralkyl group, and at least one of R1a to R1d represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted by a fluorine atom.