Single wafer type cleaning method and apparatus
AssigneeSes S.A.
InventorsYuji Ono, Ryoichi Ohkura
Life of this patent
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Abstract
A single wafer type wet-cleaning technique for wet-cleaning wafers, individually, which are not stored in a cassette, at the front and back faces thereof simultaneously, in a sealed cleaning housing, whereby a plurality of chemical fluids are vertically and sequentially supplied from a number of upper side supply nozzles 25 and lower side supply nozzles 26 to the front and back faces of each wafer W to clean the same, and purified water is always caused to flow out of the lower side supply nozzles 26, 26, . . . , which do not supply chemical fluids, of the lower side supply nozzles, thereby preventing the occurrence of cross contamination of various chemical fluids between cleaning treatments.
Claims10
A single wafer type substrate cleaning method for wet-cleaning wafers, individually, which are not stored in a cassette, in a sealed cleaning housing, said method consisting of:
- vertically and sequentially supplying a plurality of chemical fluids t o front and back faces of each wafer, which is rotatably supported in the cleaning housing, from upper and lower side supply nozzles so as to clean each wafer;
- and
- causing purified water to always flow out of the lower side supply nozzles which do not supply chemical fluids, of the lower side supply nozzles.
A single wafer type substrate cleaning apparatus for cleaning wafers, individually, which are not stored in a cassette, in a sealed cleaning housing, said apparatus comprising:
- wafer rotary means for supporting and rotating each wafer in the cleaning housing in the horizontal position;
- a cleaning chamber provided at the outer peripheral portion of the wafer rotary means for forming a cleaning treatment space for cleaning the wafer which is rotatably supported by the wafer rotary means;
- and
- chemical fluid supply means for supplying chemical fluids to the front and back faces of the wafer which is rotatably supported by the wafer rotary means, said chemical fluid supply means being provided in the cleaning housing and comprising upper side supply nozzles for supplying chemical fluids to the front face of the wafer from the upper side thereof, and lower side supply nozzles for supplying chemical fluids to the back face of the wafer from the lower side thereof;
- wherein the upper and lower side supply nozzles vertically and sequentially supply a plurality of chemical fluids to the front and back faces of the wafer which is rotatably supported by the wafer rotary means, thereby cleaning the wafer, and purified water is always forced to flow out of the lower side supply nozzles which do not supply chemical fluids, of the lower side supply nozzles in the series of cleaning treatments.
Dependencies are inferred from the claim text.