Wet cleaning device
OwnerHsin-Ta Chien, Hsuang-Sheng Tung +1inventors
InventorsHsin-Ta Chien, Hsuang-Sheng Tung, Ching-Yuan Chen
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Abstract
A wet cleaning device for chemically cleaning a plurality of wafers. The wet cleaning device includes a plurality of first chemical cleaning tanks for conducting a first cleaning procedure, a plurality of second chemical cleaning tanks for conducting a second cleaning procedure, a transferring tank including a first measuring device for measuring the wafers after the first cleaning procedure, a measuring tank including a second measuring device for measuring the wafers after the second cleaning procedure, a first transporting device, and a second transporting device.
Claims12
A wet cleaning device suitable for chemically cleaning a plurality of wafers, comprising:
- a plurality of first chemical cleaning tanks for conducting a first cleaning procedure on the wafers;
- a plurality of second chemical cleaning tanks for conducting a second cleaning procedure on the wafers;
- a transferring tank disposed between the first and second cleaning tanks and including a first measuring device for measuring the wafers after the first cleaning procedure is completed;
- a measuring tank including a second measuring device for measuring the wafers after the second cleaning procedure is completed;
- a first transporting device for loading, removing and transporting the wafers between the first chemical cleaning tanks and the transferring tank;
- and
- a second transporting device for loading, removing and transporting the wafers to the transferring tank, the second chemical cleaning tanks, and the measuring tank.
Dependencies are inferred from the claim text.