Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film

A processing apparatus comprising:

• a lower chamber containing a susceptor for holding a substrate that is to be processed;
• an upper chamber provided above the lower chamber;
• antenna means arranged around the upper chamber, for generating an induction magnetic field in the upper chamber and on the substrate;
• high-frequency wave applying means for applying high-frequency power to the antenna means;
• gas-supplying means for supplying a plurality of process gases onto the substrate in the lower chamber;
• gas-exhausting means for exhausting the process gases from the upper and lower chambers;
• and
• a film formed by sprayed on an inner surface of the upper chamber and containing a compound of a III-a element of the periodic table, for preventing corrosion from taking place while the substrate is being processed,
• wherein an induction electromagnetic field is generated in the upper and lower chambers, generating a plasma, and the plasma is applied to the substrate, thereby to process the substrate.

A processing apparatus comprising:

• a lower chamber containing a susceptor for holding a substrate that is to be processed;
• an upper chamber provided above the lower chamber;
• antenna means arranged around the upper chamber, for generating an induction magnetic field in the upper chamber and on the substrate;
• high-frequency wave applying means for applying high-frequency power to the antenna means;
• a gas-supplying means for shaped like a ring, surrounding an upper part of the lower chamber, and supplies the process gases and a plasma-generating gas into the lower chamber so that the gases may mix at a position above the substrate held on the susceptor;
• and
• gas-exhausting means for exhausting the process gases from the upper and lower chambers,
• wherein an induction electromagnetic field is generated in the upper chamber, generating a plasma, and the plasma is applied to the substrate, thereby to process the substrate.