Purification of gas streams
AssigneeAir Products and Chemicals, Inc.
InventorsGregory Scott Weyrich, Shyam Ramchand Suchdeo, Christopher James Raiswell, Elizabeth Helen Salter
Life of this patent
Estimating the term…
Loading patent…
AssigneeAir Products and Chemicals, Inc.
InventorsGregory Scott Weyrich, Shyam Ramchand Suchdeo, Christopher James Raiswell, Elizabeth Helen Salter
Estimating the term…
A method for removing a first and a second minor component from a gas mixture comprising the first and second minor components and one or more major components. The method comprises providing a first adsorbent zone containing a first adsorbent material and a second adsorbent zone containing a second adsorbent material wherein the selectivity of the first adsorbent material for the first minor component relative to the second minor component is greater than the selectivity of the second adsorbent material for the first minor component relative to the second minor component. The average particle diameter of the first adsorbent material and the average particle diameter of the second adsorbent material preferably are substantially the same. The gas mixture is passed through the first adsorbent zone and subsequently through the second adsorbent zone. A purified gas containing the one or more major components and depleted in the first and second minor component is withdrawn from the second adsorbent zone.
A method for removing a first and a second minor component from a gas mixture comprising the first and second minor components and one or more major components, which method comprises the steps of:
A system for removing a first and a second minor component from a gas mixture comprising the first and second minor components and one or more major components, which system comprises:
Dependencies are inferred from the claim text.