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AssigneeFujitsu Limited
InventorsKazuhiko Takahashi, Masahiko Minemura, Mitsuo Sakurai, Kazuya Sugawa
Estimating the term…
An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data.
An apparatus for designing a mask used for fabricating semiconductor devices, the apparatus comprising:
A method for designing a mask used for fabricating semiconductor devices, the method comprising:
A program for making a computer perform the process of designing a mask used for fabricating semiconductor devices, the program making the computer function as:
An apparatus for designing a mask used for fabricating semiconductor devices, the apparatus comprising:
A method for designing a mask used for fabricating semiconductor devices, the method comprising:
A program for making a computer perform the process of designing a mask used for fabricating semiconductor devices, the program making the computer function as:
An apparatus for designing a mask used for fabricating semiconductor devices, the apparatus comprising:
A method for designing a mask used for fabricating semiconductor devices, the method comprising:
A program for making a computer perform the process of designing a mask used for fabricating semiconductor devices, the program making the computer function as:
An apparatus for designing a mask used for fabricating semiconductor devices, the apparatus comprising:
A method for designing a mask used for fabricating semiconductor devices, the method comprising:
A program for making a computer perform the process of designing a mask used for fabricating semiconductor devices, the program making the computer function as:
A method for fabricating semiconductor devices by the use of a mask, the method comprising:
Dependencies are inferred from the claim text.