Back to results
US 2003/0198787 A1Published application
Device manufacturing method, device manufactured thereby and lithographic apparatus therefor
AssigneeASML Netherlands B.V.
InventorYim Bun Patrick Kwan
Life of this patent
Estimating the term…
Abstract
A device manufacturing method includes performing field-by-field multiple exposure. In this way, each target portion (or field) of a substrate can be irradiated while maintaining high overlay accuracy. Optionally, when each target portion is exposed in the same manner, a high reproducibility of the feature sizes on the substrate can be secured. Further, a mask table holds a plurality of masks that are arranged side-by-side in a direction substantially perpendicular to a scan direction. Such an arrangement enables field-by-field multiple exposure without a throughput loss.
Claims30
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- providing a projection beam of radiation using a radiation system;
- providing first and second patterning devices which are held on a support structure;
- using one of the first and second patterning devices to endow the projection beam with a pattern in its cross-section;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- projecting a first pattern on the first patterning device onto the target portion;
- and
- subsequently projecting a second pattern on the second patterning device onto the same target portion before projecting one of the first and second patterns onto another target portion.
5 more elements
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- providing a projection beam of radiation using a radiation system;
- providing a patterning device, which is held on a support structure, having a first pattern and a second pattern;
- using the patterning device to endow the projection beam with one of the first and second patterns in its cross-section;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- projecting the first pattern on the patterning device onto the target portion;
- and
- subsequently projecting the second pattern on the patterning device onto the same target portion before projecting one of the first and second patterns onto another target portion.
5 more elements
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support at least two patterning devices, the patterning devices serving to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- and
- a projection system constructed and arranged to project the patterned beam onto a target portion, wherein the apparatus is constructed and arranged to project a first pattern on the first patterning device onto the target portion and subsequently project a second pattern on the second patterning device onto the same target portion before projection of one of the first and second patterns onto another target portion.
2 more elements
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device having a first pattern and a second pattern, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate, wherein the apparatus is constructed and arranged to project the first pattern on the patterning device onto the target portion and the apparatus is constructed and arranged to subsequently project the second pattern on the patterning device onto the same target portion before projection of one of the first and second patterns onto another target portion.
1 more element
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support at least two patterning devices, the patterning devices serving to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate, wherein the patterning devices on the support structure are arranged side-by-side in a direction substantially perpendicular to a scan direction.
1 more element
Dependencies are inferred from the claim text.