Exposure method, exposure apparatus and its making method, device manufacturing method, and device

An exposure method in which an energy beam emitted from a light source irradiates a mask having a pattern formed to transfer said pattern onto a substrate via an projection optical system by synchronously moving said mask and said substrate, said exposure method comprising:

• measuring a first energy amount of said energy beam which passes through an illumination optical path from said light source to said mask by using a first photosensor;
• measuring a second energy amount of said energy beam which has passed through at least a portion of said projection optical system when said mask and said energy beam have a predetermined positional relationship by using a second photosensor;
• and
• transferring said mask pattern onto said substrate by adjusting an energy provided to said substrate based on a measurement value of said first photosensor in consideration of a measurement value of said second photosensor.

An exposure apparatus which transfers a pattern formed on a mask onto a substrate, said exposure apparatus comprising:

• an illumination optical system which irradiates an energy beam on said mask;
• a projection optical system which projects an outgoing energy beam from said mask onto said substrate;
• a first photosensor which detects an energy amount of said energy beam which passes through an inner portion of said illumination optical system;
• a second photosensor which detects an energy amount of said energy beam which has passed through at least a portion of said projection optical system;
• and
• an exposure amount control unit which controls an exposure amount provided to said substrate during exposure in accordance with detection results of said first and second photosensors.

An exposure apparatus which energy beam irradiates a mask having a pattern formed and transfers said pattern onto a substrate while synchronously moving said mask and said substrate, said exposure apparatus comprising:

• a light source which emits said energy beam;
• an illumination optical system which irradiates said energy beam from said light source onto said mask;
• a projection optical system which projects said energy beam outgoing from said mask onto an image plane;
• a first photosensor which measures an energy amount of said energy beam which passes through an inner portion of said illumination optical system;
• a second photosensor which measures an energy amount of said energy beam which passes through at least a portion of the projection optical system;
• and
• a control unit which adjusts an energy amount provided to said substrate during synchronous movement of said mask and said substrate based on a measurement value of said first photosensor in consideration of an energy amount measured with said second photosensor.

A method of making an exposure apparatus which transfers a pattern formed on a mask onto a substrate, said method comprising:

• providing an illumination optical system which irradiates an energy beam on said mask;
• providing a projection optical system which projects an outgoing energy beam from said mask onto said substrate;
• providing a first photosensor which detects an energy amount of said energy beam which passes through an inner portion of said illumination optical system;
• providing a second photosensor which detects an energy amount of said energy beam which has passed through at least a portion of said projection optical system;
• and
• providing an exposure amount control unit which controls an exposure amount provided to said substrate during exposure in accordance with detection results of said first and second photosensors.

A method of making an exposure apparatus which energy beam irradiates a mask having a pattern formed and transfers said pattern onto a substrate while synchronously moving said mask and said substrate, said method comprising:

• providing a light source which emits said energy beam;
• providing an illumination optical system which irradiates said energy beam from said light source onto said mask;
• providing a projection optical system which projects said energy beam outgoing from said mask onto an image plane;
• providing a first photosensor which measures an energy amount of said energy beam which passes through an inner portion of said illumination optical system;
• providing a second photosensor which measures an energy amount of said energy beam which passes through at least a portion of the projection optical system;
• and
• providing a control unit which adjusts an energy amount provided to said substrate during synchronous movement of said mask and said substrate based on a measurement value of said first photosensor in consideration of an energy amount measured with said second photosensor.