US 2003/0197842 A1 · System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position

Abstract

Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element having a pupil plane. An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy received by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.

Drawings

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Drawings

Claims29

Dependent claims

A lithography device, comprising:

an illumination source;
an illumination optics module that receives electromagnetic energy emitted by said illumination source, said illumination optics module having a partial coherence adjuster module comprising:
a one-dimensional optical transform element having a pupil plane, and
an aperture device having an aperture used to vary the angular distribution of electromagnetic energy entering said one-dimensional optical transform element along an axis, the aperture of said aperture device being located proximate to the pupil plane of said one-dimensional optical transform element;
a reticle stage positioned adjacent to said illumination optics module, wherein electromagnetic energy exiting said illumination optics module will illuminate a portion of a reticle held by said reticle stage;
a wafer stage;
and
a projection optics module having an image plane proximate to said wafer stage, said projection optics module positioned adjacent to said reticle stage and adjacent to said wafer stage, wherein electromagnetic energy passing through the reticle held by said reticle stage will enter said projection optics module and be imaged by said projection optics module on a photosensitive substrate of a wafer held by said wafer stage, and
wherein a shape of the aperture of said aperture device is adjusted to control the angular distribution of electromagnetic energy at the image plane proximate to said wafer stage.

6 more elements

Dependencies are inferred from the claim text.

Description5,325 words

Summary957 words

#The following application of common assignee is related to the present application, and is herein incorporated by reference in its entirety:

#“System and Method for Improving Line Width Control in a Lithography Device Using an Illumination System Having Pre-Numerical Aperture Control,” Ser. No. ______, filed on the same day herewith.

#This invention relates to lithography. More particularly, it relates to line width control in a lithography device.

Brief description of the drawings12 figures

#The present invention is described with reference to the accompanying figures. The accompanying figures, which are incorporated herein and form part of the specification, illustrate the present invention and, together with the description, further serve to explain the principles of the invention and to enable a person skilled in the relevant art to make and use the invention. In the figures, like reference numbers indicate identical or functionally similar elements. Additionally, the leftmost digit or digits of a reference number identify the figure in which the reference number first appears.

#FIG. 1 illustrates an example lithography device that incorporates the invention.

#FIG. 2 illustrates how to measure the partial coherence of the lithography device of FIG. 1.

Detailed description4,076 words

#The present invention provides a system and method for improving linewidth control in a lithography device. As will be apparent from the detailed description herein, the present invention is particularly well adapted for use with a step-and-scan lithography device.

#In the description that follows, reference will be made in detail to present embodiments of the invention, examples of which are illustrated in the accompanying drawings. While the invention will be described in conjunction with the present embodiments, it will be understood that they are not intended to limit the invention to just these embodiments. On the contrary, the invention is intended to cover alternatives, modifications and equivalents, which can be included within the spirit and scope of the invention as defined by the appended claims. Furthermore, in the following description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be obvious, however, to one skilled in the art, upon reading this disclosure, that the present invention can be practiced without these specific details. In other instances, well-known structures and devices are not described in detail in order to avoid obscuring aspects of the present invention.

#Terminology

Facts

Application

10/127,505Filed 23 Apr 2002

Published

23 Oct 2003

Term ends

Not estimatedThe source records don’t support an estimate.

Classification2 codes

G03F 7/70091
Mask illumination systems: illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane;…
G03F
Photomechanical production of textured or patterned surfaces

Timeline

23 Apr 2002Application filedUS 10/127,505
23 Apr 2002Assigned to Asml US, Inc.assignment of assignor's interest
19 Jun 2003Assigned to Asml Holding N.V.assignment of assignor's interest
23 Oct 2003Published
6 Aug 2004Assigned to Asml US, LLCconversion
6 Aug 2004Assigned to Asml US, Inc.merger

System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position

Life of this patent

System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position

Life of this patent

Life of this patent

Abstract

Drawings

Drawings

Claims29

Description5,325 words

Drawings

Classification2 codes

Life of this patent

Description5,325 words