Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method

A scanning-exposure method for transferring a pattern formed on a mask onto a substrate by illuminating the pattern with an illumination light, and for moving the mask in a direction of travel perpendicular to an optical axis of the illuminating light, the scanning exposure method comprising:

• generating a vacuum adhesion force between the mask and a mask holder that holds the mask;
• applying an external force to the mask, wherein the external force is different from the vacuum adhesion force, and wherein the external force effects to the mask in a direction perpendicular to a formation surface of the mask pattern formed on the mask;
• and
• moving the mask holder in a direction of travel perpendicular to the optical axis when the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.

A holding apparatus which holds a mask in a light exposure apparatus, the mask containing a pattern to be transferred onto a substrate by illuminating the pattern with an illumination light, and the light exposure apparatus being a scanning-type exposure apparatus that moves the mask in a direction of travel perpendicular to an optical axis of the illumination light while the mask pattern is illuminated by the illumination light, the holding apparatus comprising:

• a mask holder which holds the mask, wherein the mask holder travels in a direction perpendicular to the optical axis;
• a vacuum adhesion device which generates a vacuum adhesion force between the mask and the mask holder, wherein the mask is adhered to the mask holder by the vacuum adhesion force;
• and
• an external force supplying system, which supplies an external force to the mask in order to maintain a predetermined positional relationship between the mask and the mask holder, wherein the external force is different from the vacuum adhesion force, wherein the external force is able to control based on information regarding a mask thickness or information regarding a moving velocity of the mask holder, and wherein the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.

A scanning exposure method for transferring a pattern formed on a mask onto a substrate by illuminating the pattern with an illumination light, and for moving the mask in a direction of travel perpendicular to an optical axis of the illumination light, the scanning exposure method comprising:

• generating a vacuum adhesion force between the mask and a mask holder that holds the mask;
• applying an external force to the mask, wherein the external force is different from the vacuum adhesion force, and wherein the external force is able to control based on information regarding a mask thickness or information regarding a moving velocity of the mask holder;
• and
• moving the mask holder in a direction of travel perpendicular to the optical axis when the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.