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US 2003/0197175 A1Published application
Test structure for evaluating antenna effects
OwnerChong-Jen Huang, Kuang-Wen Liuinventors
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Abstract
A sensitive test structure for quantitatively detecting antenna effects includes a substrate, an ONO dielectric layer formed over the substrate, an electrode formed over the ONO dielectric layer, and an antenna charge collection electrode (CCE) electrically coupled to the electrode, which is used to collect plasma-induced charge.
Claims12
A test structure for quantitatively detecting antenna effects, the test structure comprising:
- a substrate;
- an ONO dielectric layer formed over the substrate, wherein the ONO dielectric layer is composed of a bottom oxide layer, a top oxide layer, and a silicon nitride layer interposed between the bottom oxide layer and the top oxide layer;
- an electrode formed over the ONO dielectric layer;
- and
- an antenna charge collection electrode (CCE) electrically coupled to the electrode, the antenna CCE being used to collect plasma-induced charge.
2 more elements
A test wafer for evaluating plasma-induced antenna effects, the test wafer comprising:
- a silicon wafer;
- an array of NROM-like test structures formed on the silicon wafer, wherein each NROM-like test structure comprises:
- a substrate;
- an ONO dielectric layer formed over the substrate, the ONO dielectric layer composed of a bottom oxide layer, a top oxide layer and a silicon nitride layer interposed between the bottom oxide layer and the top oxide layer;
- an electrode formed over the ONO dielectric layer;
- and
- an antenna charge collection electrode (CCE) electrically coupled to the electrode, the antenna CCE used to collect plasma-induced charge.
4 more elements
Dependencies are inferred from the claim text.