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US 2003/0194640 A1Published application
Positive resist composition
AssigneeFuji Photo Film Co., Ltd.
InventorKenichiro Sato
Life of this patent
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Abstract
A positive resist composition comprising: (A) a resin which comprises a repeating unit represented by the following formula (I): 1 wherein R1 represents a hydrogen atom or an alkyl group, A1 represents a single bond or a linking group, R2 represents an alkylene group, and X represents an alkoxy group or a hydroxyl group, and exhibits an increased rate of dissolution in an alkali developing solution by an action of an acid; and (B) a compound capable of generating an acid on exposure to active light rays or a radiation.
Claims11
A positive resist composition comprising:
- (A) a resin which comprises a repeating unit represented by the following formula (I):
- 102
- wherein R1 represents a hydrogen atom or an alkyl group, A1 represents a single bond or a linking group, R2 represents an alkylene group, and X represents an alkoxy group or a hydroxyl group,
- and exhibits an increased rate of dissolution in an alkali developing solution by an action of an acid;
- and
- (B) a compound capable of generating an acid on exposure to active light rays or a radiation.
3 more elements
Dependencies are inferred from the claim text.