Method of inspecting photo-mask
AssigneeDai Nippon Printing Co., Ltd.
InventorsMorihisa Hoga, Hiroyuki Inomata
Life of this patent
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Abstract
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.
Claims6
A method of inspecting a photo-mask comprising performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.
Dependencies are inferred from the claim text.