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US 2003/0192577 A1Published application
Method and apparatus for wafer cleaning
AssigneeApplied Materials, Inc.
InventorsRandhir Thakur, Steven Verhaverbeke, J. Kelly Truman
Life of this patent
Estimating the term…
Abstract
A single wafer cleaning apparatus that includes a rotatable bracket that can hold and rotate a wafer and that also includes a UV light tube capable of being positioned parallel to, and a short distance from, a wafer top surface to radiate oxygen above the wafer top surface with UV light rays to produce ozone.
Claims21
An apparatus, comprising:
- a rotatable wafer holding bracket to hold and rotate a wafer inside a single wafer cleaning chamber;
- and
- a UV light tube capable of being positioned parallel to, and a short distance from, a wafer top surface to radiate oxygen (O2) above the wafer top surface with UV light rays to produce ozone (O3).
A single wafer cleaning chamber, comprising:
- a rotatable wafer holding bracket;
- a transducer plate;
- a source of UV light capable of radiating to a top surface of a wafer, the UV light source positioned as close to the wafer surface as possible without touching the wafer top surface.
A method, comprising:
- placing a wafer in a wafer holding bracket within a single wafer cleaning chamber;
- positioning a UV light tube parallel to, and a short distance from, a surface of the wafer;
- exposing the wafer surface to ozone (O3) by radiating oxygen (O2) above the wafer surface with UV light;
- and
- cleaning the wafer surface with a wafer cleaning process.
2 more elements
A method for use of a single wafer cleaning chamber, comprising:
- placing a wafer in a wafer holding bracket within the single wafer cleaning chamber;
- positioning the UV light tube parallel to, and approximately 3 millimeters from, a top surface of the wafer;
- radiating the wafer top surface with UV light;
- and
- processing the wafer through a wafer cleaning process.
2 more elements
Dependencies are inferred from the claim text.