Method and apparatus for wafer cleaning
AssigneeApplied Materials, Inc.
InventorsRandhir Thakur, Steven Verhaverbeke, J. Kelly Truman
Life of this patent
Estimating the term…
Abstract
A single wafer cleaning apparatus that includes a rotatable bracket that can hold a wafer, a rinse fluid having a first surface tension, a second fluid having a second surface tension lower than the first surface tension, a first nozzle capable of applying the rinse fluid at a first location on the wafer positioned in the bracket, second nozzle capable of applying the second fluid at a second location on the wafer where the second location is inboard of the first location, and the first nozzle and the second nozzle are capable of moving across the wafer to translate the first location and the second location from the wafer center to the wafer outer edge.
Claims38
A single wafer cleaning apparatus, comprising:
- a rotatable bracket capable of holding a wafer;
- a first fluid having a first surface tension;
- a second fluid having a second surface tension lower than the first surface tension;
- a first nozzle capable of applying the first fluid at a first location on the wafer positioned in the bracket;
- a second nozzle capable of applying the second fluid at a second location on the wafer where the second location is inboard of the first location, and
- the first nozzle and the second nozzle are capable of moving across the wafer to translate the first location and the second location from the wafer center to the wafer outer edge.
A method for removing particles from a single wafer, comprising:
- rotating the wafer;
- flowing a first fluid onto the wafer approximately at the wafer center;
- flowing a second fluid having a lower surface tension than the first fluid onto the inboard side of the first fluid on the wafer;
- and
- moving the flow of first fluid to the wafer edge.
A method of maintaining a wafer in a bracket, comprising:
- positioning the wafer in the bracket;
- positioning a transducer plate beneath the bracket;
- flowing a first chemical onto the wafer top surface creating a downward force onto the wafer
- flowing a second chemical through the transducer plate to fill a gap between the transducer plate and the wafer to create a capillary force on the wafer;
- and
A method of maintaining a wafer in a bracket, comprising:
- positioning the wafer in the bracket;
- positioning a transducer plate beneath the bracket;
- placing a gas in a gap between the transducer plate the wafer;
- rotating the wafer in the bracket;
- and
- flowing a gas onto the wafer top surface, such that a pressure differential exists between the wafer top surface and the wafer bottom surface and a downward force onto the wafer results.
An single wafer cleaning chamber, comprising:
- a rotatable wafer holding bracket;
- a transducer plate;
- and
- means for holding a wafer in the bracket during a cleaning cycle.
A single wafer cleaning chamber, comprising,
- a rotatable wafer holding bracket;
- a transducer plate;
- a source of UV light capable of radiating to a top surface of a wafer positioned in the rotatable wafer holding bracket.
A method for use of a single wafer cleaning chamber, comprising:
- placing a wafer in a wafer holding bracket within the single wafer cleaning chamber;
- radiating the wafer top surface with UV light;
- and
- processing the wafer through a wafer cleaning process.
A method for a single wafer cleaning chamber, comprising:
- obtaining a wafer having contaminants on a top surface;
- rotating the wafer in the single wafer cleaning chamber;
- creating a Marangoni force on the contaminants that is directed to an outer diameter of the wafer by flowing chemicals onto the top surface of the wafer;
- and
- moving the Marangoni force from a center of rotation of the wafer to the outer diameter of the wafer by moving the flow of chemicals.
Dependencies are inferred from the claim text.