Apparatus for etching glass substrate
AssigneeLG. Philips LCD Co., Ltd.
InventorWoong Kwon Kim
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AssigneeLG. Philips LCD Co., Ltd.
InventorWoong Kwon Kim
Estimating the term…
An apparatus for etching a glass substrate includes a first bath containing an etchant, at least one porous panel having a plurality of jet holes in the first bath, the porous panel containing the etchant to jet the etchant against the glass substrate, a container storing the etchant, and a pump supplying the etchant from the container to the porous panel, the pump being connected to the container and the porous panel.
An apparatus for etching a glass substrate, comprising:
An apparatus for etching a glass substrate, comprising:
An apparatus for etching a glass substrate, comprising:
An apparatus for etching a glass substrate, comprising:
Dependencies are inferred from the claim text.
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For wet etching: with the semiconductor substrates being dipped in baths or vessels
For wet etching: using mainly spraying means, e.g. nozzles
Generic processes or apparatus for the manufacture or treatment of devices covered
Term end not estimated
This application claims the benefit of Korean application No. 1996-23779 filed on Jun. 26, 1996, which is hereby incorporated by reference.
1. Field of the Invention
The present invention relates to an etching apparatus, and more particularly, to an apparatus for etching glass substrate uniformly.
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention. In the drawings:
FIG. 1 is a schematic view of an etching apparatus according to a first embodiment of the present invention;
FIG. 2 illustrates a porous panel of the first embodiment;
Reference will now be made in detail to the preferred embodiments of the present invention, examples of which are illustrated in the accompanying drawings.
Referring to FIG. 1, an inner bath 13 is mounted within an outer bath 11. A height of the inner bath 13 containing an etchant is lower than that of the outer bath 11, so that the etchant passing over the inner bath 13 is collected in the bottom of the outer bath 11. In the inner bath 13, an establishment stand 18 is mounted. A plurality of porous panels 15 are attached on the establishment stand 18 and the glass substrates are positioned between the porous panels 15. As shown in FIG. 2, a plurality of jet holes 16 are formed on the porous panel 15 in the vertical and horizontal directions to jet the etchant in the porous panels 15 into glass substrates 30 (shown in FIG. 3). Between the porous panels 15 on the establishment stand 18, a pair of projections 19 to hold the glass substrates are formed.
The outer bath 11 is connected to a filter 22 and a pipe 23. The etchant passed over the inner bath 13 is thus collected in the bottom of the outer bath 11 and flows into the filter 22 through the pipe 23 for filtering the collected etchant. The filtered etchant flows into the storage container 20 through the pipe 29. A pump 24 is connected to the storage container 20 to supply the etchant to the inner space of the establishment stand 18 through the supplying pipe 25.