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US 2003/0169517 A1Published application
Objective, in particular a projection lens for microlithography
AssigneeCarl Zeiss SMT GmbH
InventorUlrich Weber
Life of this patent
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AssigneeCarl Zeiss SMT GmbH
InventorUlrich Weber
Estimating the term…
An objective, in particular a projection lens for microlithography, is provided with at least one optical element (8) that is mounted in an inner mount (9a), the inner mount (9a) being connected to the outer mount (9b). A manipulator device (21) performs a displacement of the optical element (8), preferably in at least one direction that lies at least approximately parallel to the optical axis. At least one elastically deformable strip (13) is arranged in a gap (12) between the inner mount (9a) and the outer mount (9b), the strip being connected in each case via a fastening section (15) to the inner mount (9a) and the outer mount (9b), and the two fastening sections (15) being connected to one another by an arcuate section (18, 19) and free bearing parts (16, 17) situated therebetween.
An objective having at least one optical element that is mounted in an inner mount, the inner mount being connected to an outer mount, and having a manipulator device for displacing said optical element in at least one direction, wherein at least one elastically deformable strip is arranged in a gap between said inner mount and said outer mount, said strip being connected in each case via a fastening section to said inner mount and said outer mount, and the two fastening sections being connected to one another by an arcuate section and free bearing parts situated therebetween.
Dependencies are inferred from the claim text.