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US 2003/0169408 A1Published application
Exposure apparatus and manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorYoshinori Miwa
Life of this patent
Estimating the term…
Abstract
An exposure apparatus includes an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by the illumination system, a conditioning system for circulating an inside gas of the exposure apparatus; and a control system for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.
Claims10
An exposure apparatus, comprising:
- an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by said illumination system;
- a conditioning system for circulating an inside gas of said exposure apparatus;
- and
- executing means for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.
1 more element
A device manufacturing method, comprising the steps of:
- illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by said illumination system;
- circulating an inside gas;
- performing at least one of ozone removal and ozone detection, for ozone in the gas circulated;
- developing the substrate having the pattern printed thereon, for production of a device.
1 more element
Dependencies are inferred from the claim text.