Negative resist composition

A negative resist composition comprising:

• (A) an alkali-soluble polymer;
• (B) a cross-linking agent that forms a cross-link between the alkali-soluble polymers (A) by the action of an acid;
• and
• (C) an acid generator that is represented by the following formula (I) and is capable of generating an acid upon irradiation with one of an actinic ray and a radiation;
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• wherein R1 to R5, which are the same or different, each represents a hydrogen atom, a nitro group, a halogen atom, an alkyl group, an alkoxy group, an alkyloxycarbonyl group, an aryl group or an acylamino group;
• at least two of R1 to R5 may be combined with each other to form a cyclic structure;
• R6 and R7, which are the same or different, each represents a hydrogen atom, a cyano group, an alkyl group or an aryl group;
• Y1 and Y2, which are the same or different, each represents an alkyl group or an alkenyl group, with proviso that, when both Y1 and Y2 are alkyl groups, at least one of the alkyl groups represented by Y1 and Y2 has one of a hydroxyl group, an ether linkage group and a sulfide linkage group, or the alkyl groups represented by Y1 and Y2 each contains at least two carbon atoms;
• Y1 and Y2 may be combined with each other to form a ring together with S+;
• at least one of R1 to R5 and at least one of Y1 and Y2 may be combined with each other to form a ring;
• at least one of R1 to R5 and at least one of R6 and R7 may be combined with each other to form a ring;
• at least two of the compounds represented by formula (I) may combine with each other via a linkage group at the site of any one of R1 to R7, Y1 and Y2 to form a dimmer or more;
• X− represents a non-nucleophilic anion.