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US 2003/0165772 A1Published application
Negative resist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsHyou Takahashi, Shoichiro Yasunami
Life of this patent
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Abstract
A negative resist composition comprising: (A) a compound capable of generating an acid on exposure to active light or a radiation; (B) a resin soluble in an aqueous alkali solution; (C) a compound having an alcohol structure which is excited by the acid generated by the component (A) to reduce an alkali solubility of a resist film formed of the negative resist composition; (D) a crosslinking agent which is excited by the acid generated by the component (A) to induce a crosslinking reaction; and (E) a solvent.
Claims17
A negative resist composition comprising the components of:
- (A) a compound capable of generating an acid on exposure to active light or a radiation;
- (B) a resin soluble in an aqueous alkali solution;
- (C) a compound having an alcohol structure which is excited by the acid generated by the component (A) to reduce an alkali solubility of a resist film formed of the negative resist composition;
- (D) a crosslinking agent which is excited by the acid generated by the component (A) to induce a crosslinking reaction;
- and
- (E) a solvent.
3 more elements
Dependencies are inferred from the claim text.