Method of manufacturing electronic device
AssigneeHitachi, Ltd.
InventorsToshihiko Tanaka, Takashi Tattori
Life of this patent
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Abstract
A method of manufacturing an electronic device that includes the step of forming a pattern on a substrate by using a halftone phase shift mask where the halftone phase shift mask includes a translucent phase shift pattern having an aperture; and an auxiliary pattern, disposed near the aperture and having as a principal component an organic film which possesses a light attenuating property or a light shielding property against exposure light. The halftone phase shift mask fabricating Turn-Around-Time (TAT) is shortened thereby shortening the development time required for an electronic device, the production cost of which has also been reduced.
Claims40
A method of manufacturing an electronic device comprising the step of forming a pattern on a substrate by using a halftone phase shift mask, wherein the halftone phase shift mask comprises:
- a translucent phase shift pattern having an aperture;
- and
- an auxiliary pattern, disposed near the aperture and having as a principal component an organic film which possesses a light attenuating property or a light shielding property against exposure light.
A method of manufacturing an electronic device comprising the step of forming a pattern on a substrate by using a halftone phase shift mask, wherein the halftone phase shift mask comprises:
- a translucent phase shift pattern having an aperture;
- and
- an auxiliary pattern formed using a photosensitive composition and disposed near the aperture, the photosensitive composition containing a radical forming agent which forms radicals against electron beam or light and also containing a black matrix.
A method of manufacturing an electronic device comprising the step of forming a pattern on a substrate by using a halftone phase shift mask, wherein the halftone phase shift mask comprises:
- a translucent phase shift pattern for forming an isolation region for electrical isolation of circuit components from each other, the phase shift pattern having an aperture;
- and
- an auxiliary pattern having an organic film as a principal component, the auxiliary pattern being disposed near the aperture, to diminish or prevent the generation of sub peaks in a transfer image of the aperture to the substrate.
A method of manufacturing and electronic device, comprising the steps of:
- providing a halftone phase shift mask manufactured according a method comprising the steps of:
- providing a transparent substrate having a translucent phase shift film formed thereon,
- forming a pattern having an aperture in the translucent phase shift film,
- judging whether the translucent phase shift film formed with the aperture is good or not, and
- forming an auxiliary pattern near the aperture of the translucent phase shift film judged to be good, the auxiliary pattern having an organic film as a principal component;
- mounting the halftone phase shift mask to a projection exposure system such that the surface of the mask with the translucent phase shift film formed thereon faces down;
- and
- transferring the pattern, formed on the halftone phase shift mask, onto a substrate disposed on a sample stage in the projection exposure system.
A method of manufacturing an electronic device, comprising the steps of:
- providing a halftone phase shift mask manufactured according a method comprising the steps of:
- providing a transparent substrate having a translucent phase shift film formed thereon,
- forming in the translucent phase shift film an aperture which includes a device pattern and an alignment mark pattern, and
- forming an auxiliary pattern with use of the alignment mark pattern, the auxiliary pattern having an organic film as a principal component and being formed near the aperture formed in the translucent phase shift film;
- mounting the halftone phase shift mask to a projection exposure system such that the surface of the mask with the translucent phase shift film formed thereon faces down;
- and
- transferring the pattern, formed on the halftone phase shift mask, onto a substrate disposed on a sample stage in the projection exposure system.
A method of manufacturing an electronic device, comprising the steps of:
- transferring a pattern onto a first substrate by using a halftone phase shift mask, the halftone phase shift mask comprising a translucent phase shift pattern having an aperture and an auxiliary pattern disposed near the aperture, the auxiliary pattern having an organic film as a principal component which possesses a light attenuating property or a light shielding property against exposure light;
- checking whether an unnecessary pattern has been transferred onto the first substrate;
- providing, if an unnecessary pattern has been transferred, a halftone phase shift mask having a corrected auxiliary pattern, the corrected auxiliary pattern being obtained on the basis of information on the size and position of the unnecessary pattern;
- and
- transferring a pattern onto a second substrate by using the halftone phase shift mask having the corrected auxiliary pattern.
A method of manufacturing an electronic device, comprising the steps of:
- providing a halftone phase shift mask, the halftone phase shift mask comprising a translucent phase shift pattern having an aperture, an auxiliary pattern disposed near the aperture and having an organic film as a principal component which possesses a light attenuating property or a light shielding property against exposure light, and a light shielding zone disposed in a peripheral portion;
- mounting the halftone phase shift mask to a projection exposure system such that the surface of the mask with the translucent phase shift pattern formed thereon faces down;
- and
- transferring the translucent phase shift pattern formed on the halftone phase shift mask onto a substrate disposed on a sample stage in the projection exposure system.
A method of manufacturing an electronic device, which comprises transferring a pattern onto a substrate by using a photomask, wherein the photomask comprises:
- a substrate which is transparent to exposure light, a phase shift pattern, formed on the transparent substrate, being translucent to exposure light for forming a device pattern, and
- an auxiliary pattern comprising a photosensitive organic film.
A method of manufacturing an electronic device comprising the step of transferring a pattern onto a substrate by using a mask, wherein the mask is fabricated according a method comprising the steps of:
- forming a phase shift film which is translucent to exposure light on a substrate which is transparent to exposure light,
- forming a device circuit pattern on the phase shift film,
- coating the substrate with a negative type photosensitive composition,
- exposing the negative type photosensitive composition to light, and
- making development to form an auxiliary pattern on the photosensitive composition different from a main pattern.
A method of manufacturing an electronic device comprising the step of transferring a pattern onto a substrate by using a mask, wherein the mask is fabricated according a method comprising the steps of:
- forming a phase shift film which is translucent to exposure light onto a substrate which is transparent to exposure light,
- forming a reference alignment mark pattern together with a device circuit pattern on the phase shift film,
- coating the substrate with a photosensitive composition,
- making alignment with reference to the reference alignment mark pattern and exposing an auxiliary pattern different from a main pattern to the photosensitive composition, and
- making development to form an auxiliary pattern on the photosensitive composition.
A method of manufacturing an electronic device comprising the steps of:
- mounting a photomask to a projection exposure system such that a surface thereof faces down, and
- transferring a pattern onto a substrate placed on a sample stage in the projection exposure system, wherein the photomask comprises a substrate which is transparent to exposure light, a phase shift pattern, formed on the transparent substrate, being translucent to exposure light for forming a device pattern, and an auxiliary pattern comprising a photosensitive organic film.
A method of manufacturing an electronic device, comprising the steps of:
- forming a phase shift film which is translucent to exposure light on a substrate which is transparent to exposure light,
- forming a device circuit pattern on the phase shift film,
- coating the substrate with a negative type photosensitive composition,
- exposing an auxiliary pattern different from a main pattern to the negative type photosensitive composition,
- making development to form an auxiliary pattern of the negative type photosensitive composition, thereby providing a photomask,
- making a pattern exposure with use of the photomask,
- removing the negative type photosensitive composition,
- coating again the photomask with a negative type photosensitive composition,
- exposing an auxiliary pattern different from a main pattern to the negative type photosensitive composition,
- making development to form an auxiliary pattern of the negative type photosensitive composition, thereby providing a second photomask,
- mounting the second photomask to a projection exposure system such that a surface thereof faces down, and
- transferring a pattern onto a substrate placed on a sample stage in the projection exposure system.
A method of manufacturing an electronic device comprising the steps of:
- forming a phase shift film which is translucent to exposure light on a substrate which is transparent to exposure light,
- forming a device circuit pattern on the phase shift film,
- coating the substrate with a negative type photosensitive composition,
- exposing an auxiliary pattern different from a main pattern to the negative type photosensitive composition,
- making development to form an auxiliary pattern of the negative type photosensitive composition, thereby providing a photomask,
- making a pattern exposure with use of the photomask to produce a first electronic device,
- removing the negative type photosensitive composition,
- coating the photomask with a negative type photosensitive composition, exposing an auxiliary pattern different from a main pattern to the negative type photosensitive composition,
- making development to form an auxiliary pattern of the negative type photosensitive composition, thereby providing a second photomask, and making a pattern exposure with use of the second photomask to produce a second electronic device.
Dependencies are inferred from the claim text.