Method and system for compensating exposure value for exposure process as well as exposure system and semiconductor manufacturing system
AssigneeNEC Corporation
InventorsMasao Ikuno, Masahiko Kishi, Masaaki Yomo
Life of this patent
Estimating the term…
Abstract
A method of determining an exposure value for exposing a resist film, comprises the steps of: estimating a size variation of a resist pattern from a predetermined target size based on a waiting time of a currently processing resist film to be patterned in subsequent sequential exposure and development processes; and compensating a reference exposure value based on said size variation to obtain a compensated exposure value.
Claims28
A system for determining an exposure value for exposing a resist film, said system comprising:
- means for estimating a size variation of a resist pattern from a predetermined target size with reference to a waiting time of a currently processing resist film to be patterned in subsequent exposure process;
- and
- means for compensating a reference exposure value based on said size variation to obtain a compensated exposure value.
A computer-readable program for determining an exposure value for exposing a resist film, said program comprising the steps of:
- estimating a size variation of a resist pattern from a predetermined target size based on a waiting time of a currently processing resist film to be patterned in subsequent exposure process;
- and
- compensating a reference exposure value based on said size variation to obtain a compensated exposure value.
A semiconductor manufacturing system comprising:
- a data base for storing any data;
- a data transfer line connected to said data base for transferring data to said data base;
- at least a resist applicator for applying a resist film on a semiconductor wafer, and said resist applicator being connected to said data transfer line for supplying a first work history data set to said data base through said data transfer line;
- at least an exposure apparatus for carrying out an exposure processes to said resist film on said semiconductor wafer, and said exposure apparatus being connected to said data transfer line for supplying a second work history data set to said data base through said data transfer line;
- at least a resist pattern size measuring apparatus for measuring a resist pattern size of said semiconductor wafer, and said resist pattern size measuring apparatus being connected to said data transfer line for supplying a resist pattern size data to said data base through said data transfer line;
- at least an etching apparatus for etching said semiconductor wafer with said resist pattern;
- at least a wafer pattern size measuring apparatus for measuring a wafer pattern size of said semiconductor wafer, and said wafer pattern size measuring apparatus being connected to said data transfer line for supplying a wafer pattern size data to said data base through said data transfer line;
- and
- a controller being connected to said data transfer line for receiving said first and second work history data sets, said resist pattern size data and said wafer pattern size data from said data base, and said controller calculating a compensated exposure value based on said first and second work history data sets, said resist pattern size data and said wafer pattern size data and supplying said compensated exposure value to said exposure apparatus through said data transfer line.
An exposure system comprising:
- a data base for storing any data;
- a data transfer line connected to said data base for transferring data to said data base;
- at least an exposure apparatus for carrying out an exposure processes to said resist film on said semiconductor wafer, and said exposure apparatus being connected to said data transfer line for supplying a work history data set to said data base through said data transfer line;
- and
- a controller being connected to said data transfer line for receiving said work history data set and a past-exposure value data set from said data base, and said controller calculating a compensated exposure value based on said work history data set and said past-exposure value data set.
Dependencies are inferred from the claim text.