Lithographic tool with dual isolation system and method for configuring the same

A lithography apparatus with a dual isolation system, comprising:

• an isolated bridge to provide a mount for a projection optics, supported by a non-isolated base frame;
• a wafer stage component to provide a mount for attachment of a semiconductor wafer, supported by said non-isolated base frame;
• a reticle stage component to provide a mount for a reticle, supported by said non-isolated base frame;
• and
• an isolated optical relay supported by said non-isolated base frame, wherein said isolated optical relay includes at least one individually servo controlled framing blade.

A method for a configuring a lithography tool with a dual isolation system, comprising the steps of:

• isolating and supporting a base frame on a non-isolated tool structure;
• supporting a wafer stage component with the base frame, wherein the wafer stage component provides a mount for attachment of a semiconductor wafer;
• supporting a reticle stage component with the base frame, wherein the reticle stage component provides a mount for a reticle;
• and
• isolating and supporting a bridge on the base frame, wherein the bridge provides a mount for a projection optics.

A method for a configuring a lithography tool with a dual isolation system, comprising the steps of:

• isolating and supporting a bridge on a non-isolated base frame, wherein the bridge provides a mount for a projection optics;
• isolating and supporting an optical relay on the non-isolated base frame, wherein the optical relay includes at least one framing blade;
• supporting a wafer stage component with the non-isolated base frame, wherein the wafer stage component provides a mount for attachment of a semiconductor wafer;
• and
• supporting a reticle stage component with the non-isolated base frame, wherein the reticle stage component provides a mount for a reticle.