US 2003/0164181 A1 · Substrate processing apparatus

Abstract

A cleaning processing part and an ashing processing part are oppositely arranged flush with each other through a transport path where a transport robot is arranged. The cleaning processing part comprises a surface scrubber and a rear scrubber. The ashing processing part performs ashing with plasma. The transport robot transports a substrate to be processed from an indexer successively through the ashing processing part, a reversal part and the cleaning processing part and returns the same to the indexer again. The transport robot immediately transports the substrate completely subjected to ashing toward the cleaning processing part, whereby the time required from ashing to cleaning processing is so reduced that a dead time can be eliminated while cleaning performance can be improved by performing cleaning processing immediately after ashing. Thus, a substrate processing apparatus improving cleaning performance by reducing a dead time up to cleaning processing is provided.

Claims16

Dependent claims

A substrate processing apparatus performing cleaning processing on a substrate subjected to prescribed processing, comprising:

a cleaning part performing said cleaning processing on said substrate in a cleaning processing chamber, said cleaning part including a surface cleaning part cleaning the surface of said substrate and a rear cleaning part cleaning the rear surface;
a preprocessing part performing said prescribed processing in its processing chamber as a processing step immediately preceding said cleaning processing;
a reversal part of reversing the upper surface of said substrate;
and
a transport element transporting said substrate between said cleaning processing chamber of said cleaning part, said processing chamber of said preprocessing part and said reversal part, wherein
said cleaning part and said preprocessing part are integrally assembled into said substrate processing apparatus, and
said transport element takes out single said substrate completely subjected to said prescribed processing from said processing chamber of said preprocessing part, holds said substrate and transports said substrate to said cleaning processing chamber of said cleaning part in the single state.

4 more elements

A substrate processing apparatus performing cleaning processing on a substrate subjected to prescribed processing, comprising:

a cleaning part performing said cleaning processing on said substrate in a cleaning processing chamber;
a preprocessing part performing said prescribed processing in its processing chamber as a processing step immediately preceding said cleaning processing;
and
a transport element introducing/discharging said substrate into/from both of said cleaning processing chamber of said cleaning part and said processing chamber of said preprocessing part, wherein
said cleaning part and said preprocessing part are integrally assembled into said substrate processing apparatus and arranged facing each other across a transport path where said transport element is arranged, and
said transport element takes out single said substrate completely subjected to said prescribed processing from said processing chamber of said preprocessing part, holds said substrate and transports said substrate to said cleaning processing chamber of said cleaning part in the single state.

3 more elements

Dependencies are inferred from the claim text.

Substrate processing apparatus

Life of this patent

Substrate processing apparatus

Life of this patent

Abstract

Claims16