High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
AssigneeLambda Physik AG
InventorPeter Lokai
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AssigneeLambda Physik AG
InventorPeter Lokai
Estimating the term…
A spectrometer based on a high-resolution confocal Fabry-Perot interferometer for detection of wavelength, FWHM and/or 95% bandwidth of a laser beam of a narrow band tunable excimer or molecular fluorine lithography laser, or EUV generating source, preferably includes a reduction telescope for reducing the laser beam, a diffusor to homogenize the incident excimer or molecular fluorine lithography laser beam, a housing for mounting the confocal Fabry-Perot interferometer between windows in a sealed and temperature-stabilized housing, imaging optics for bringing the incident beam to focus at approximately a center of the interferometer, interferometer fringe imaging optics, and a photoelectric detector of the interferometer fringe image.
A spectrometeter based on a high-resolution confocal Fabry-Perot interferometer for detection of FWHM and/or 95% bandwidth of a laser beam of a narrow band tunable excimer or molecular fluorine lithography laser, comprising:
An excimer or molecular fluorine laser system, comprising:
Dependencies are inferred from the claim text.