Thinner composition and method of stripping a photoresist using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSeung-Hyun Ahn, Sang-Mun Chon, Hoe-Sik Chung, Mi-Sook Jeon, Eun-Mi Bae, Baik-Soon Choi, Ok-Seok Jang, Young-Cheul Lim
Life of this patent
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Abstract
A thinner composition is effective in removing a variety of photoresists, and includes propylene glycol mono-methyl ether acetate, ethyl 3-ethoxy propionate and at least one of γ-butyro lactone and propylene glycol mono-methyl ether. The thinner composition can selectively strip a photoresist coated on a backside and at an edge portion of a substrate, as well as a photoresist coated on a whole front surface of the substrate.
Claims21
A thinner composition for stripping a photoresist, comprising propylene glycol mono-methyl ether acetate (PGMEA), ethyl 3-ethoxy propionate (EEP), and γ-butyrolactone (GBL).
A thinner composition for stripping a photoresist, comprising propylene glycol mono-methyl ether acetate (PGMEA), ethyl (3-ethoxy) propionate (EEP), and propylene glycol mono-methyl ether (PGME).
A method of stripping a photoresist, comprising:
- providing a thinner composition which includes propylene glycol mono-methyl ether acetate (PGMEA), ethyl 3-ethoxy propionate (EEP), and at least one of γ-butyrolactone (GBL) and propylene glycol mono-methyl ether (PGME);
- stripping a photoresist coated on at least one of a backside and an edge portion of a substrate by bringing the thinner composition into contact with the photoresist;
- and
- drying the thinner composition that is brought into contact on the photoresist.
A method of stripping a photoresist, comprising:
- providing a thinner composition which includes propylene glycol mono-methyl ether acetate (PGMEA), ethyl 3-ethoxy propionate (EEP), and at least one of γ-butyrolactone (GBL) and propylene glycol mono-methyl ether (PGME);
- spraying the thinner composition onto a substrate coated with a photoresist while the substrate is rotated at a first speed;
- and
- drying the thinner composition that is brought into contact on the substrate.
Dependencies are inferred from the claim text.