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US 2003/0157440 A1Published application
Process of forming a micro-pattern of a metal or a metal oxide
AssigneeSamsung Electronics Co., Ltd.
InventorsYoung Hun Byun, Soon Taik Hwang, Euk Che Hwang, Seok Chang
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Abstract
A rapid and efficient process of forming a metal-containing pattern by producing, through photoreaction, a difference in solubility between exposed and unexposed areas of a thing film, and developing the film to produce a patterned film, followed by oxidation or reduction to provide a pure metal or metal oxide pattern.
Claims15
A method of forming a metal or metal oxide pattern on a substrate comprising the steps of:
- (a) depositing a thin film of a metal complex on a surface of the substrate;
- (b) providing a photomask having a desired pattern on the thin film;
- (c) exposing the film to a light source to cause the metal complex in the exposed areas of the film to be decomposed resulting in a difference of solubility between the exposed areas and the unexposed areas;
- (d) developing the film with an organic solvent to remove the metal complex in the unexposed areas leaving only a metal-containing patterned film;
- and
- (e) reducing or oxidizing the metal-containing patterned film to provide a pure metal or metal oxide pattern on the substrate.
3 more elements
Dependencies are inferred from the claim text.